New Chemical Vapor Deposition Findings from Seoul National University Described (Wafer-scale Homogenous Growth of Tungsten Disulfide Via Promoter-assisted Metal-organic Chemical Vapor Deposition)

  • Chul-Ho Lee

Press/Media: Press / Media

Period2025 Nov 7

Media coverage

1

Media coverage

  • TitleNew Chemical Vapor Deposition Findings from Seoul National University Described (Wafer-scale Homogenous Growth of Tungsten Disulfide Via Promoter-assisted Metal-organic Chemical Vapor Deposition)
    Media name/outletSouth Korea Daily Report
    Country/TerritoryUnited States
    Date25/11/7
    PersonsChul-Ho Lee