Studies from Korea Institute of Industrial Technology Add New Findings in the Area of Atomic Layer Deposition (Effects of Hydrogen Doping On A-gizo Thin-film Transistors With Hafnium Dioxide Gate Insulators Formed By Atomic Layer Deposition At ...)

Press/Media: Press / Media

Period2024 Apr 4

Media coverage

1

Media coverage

  • TitleStudies from Korea Institute of Industrial Technology Add New Findings in the Area of Atomic Layer Deposition (Effects of Hydrogen Doping On A-gizo Thin-film Transistors With Hafnium Dioxide Gate Insulators Formed By Atomic Layer Deposition At ...)
    Media name/outletSouth Korea Daily Report
    Country/TerritoryUnited States
    Date24/4/4
    PersonsByeong Kwon Ju