Studies from Korea University in the Area of Atomic Layer Deposition Reported (Memory Window Enhancement In N-type Ferroelectric Field-effect Transistors By Engineering Ozone Exposure In Atomic Layer Deposition of Hfzrox Films)

Press/Media: Press / Media

Period	2023 Aug 14

Media coverage

Title	Studies from Korea University in the Area of Atomic Layer Deposition Reported (Memory Window Enhancement In N-type Ferroelectric Field-effect Transistors By Engineering Ozone Exposure In Atomic Layer Deposition of Hfzrox Films)
Media name/outlet	South Korea Daily Report
Country/Territory	United States
Date	23/8/14
URL	metabase.moreover.com/noarticleurl?type=psh&lni=68Y1-VBT1-DY7R-R37Y-00000-00
Persons	Seongkeun Kim, Hyon-Sob Kim, Jinhan Cho, Hyeon Soo Kim, Hyeoncheol Kim