US Patent Issued to City University of Hong Kong on March 12 for "Far-UVC light source with an internal dielectric coating filter arranged on the interior side of electrode" (Chinese Inventors)

Press/Media: Press / Media

Period2024 Mar 13

Media coverage

1

Media coverage

  • TitleUS Patent Issued to City University of Hong Kong on March 12 for "Far-UVC light source with an internal dielectric coating filter arranged on the interior side of electrode" (Chinese Inventors)
    Media name/outletUS Fed News
    Country/TerritoryUnited States
    Date24/3/13
    PersonsKisung Lee
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