110 Attojoule-per-bit efficient graphene-based plasmon modulator on Silicon

Rubab Amin; Sikandar Khan; Cheol J. Lee; Hamed Dalir; Volker J. Sorger

doi:10.1364/CLEO_SI.2018.SM1I.5

110 Attojoule-per-bit efficient graphene-based plasmon modulator on Silicon

Rubab Amin, Sikandar Khan, Cheol J. Lee, Hamed Dalir, Volker J. Sorger

School of Electrical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

We demonstrate a plasmonic Graphene-based electro-absorption modulator heterogeneously integrated in Silicon photonics consuming 110 aJ/bit and being 15 μm compact. We show how the plasmonic metal enables steep switching via improved contact resistance.

Original language	English
Title of host publication	CLEO
Subtitle of host publication	Science and Innovations, CLEO_SI 2018
Publisher	Optica Publishing Group (formerly OSA)
ISBN (Print)	9781943580422
DOIs	https://doi.org/10.1364/CLEO_SI.2018.SM1I.5
Publication status	Published - 2018
Event	CLEO: Science and Innovations, CLEO_SI 2018 - San Jose, United States Duration: 2018 May 13 → 2018 May 18

Publication series

Name	Optics InfoBase Conference Papers
Volume	Part F94-CLEO_SI 2018
ISSN (Electronic)	2162-2701

Other

Other	CLEO: Science and Innovations, CLEO_SI 2018
Country/Territory	United States
City	San Jose
Period	18/5/13 → 18/5/18

Bibliographical note

Publisher Copyright:
© OSA 2018.

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Mechanics of Materials

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10.1364/CLEO_SI.2018.SM1I.5

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110 Attojoule-per-bit efficient graphene-based plasmon modulator on Silicon. / Amin, Rubab; Khan, Sikandar; Lee, Cheol J. et al.
CLEO: Science and Innovations, CLEO_SI 2018. Optica Publishing Group (formerly OSA), 2018. (Optics InfoBase Conference Papers; Vol. Part F94-CLEO_SI 2018).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Amin, R, Khan, S, Lee, CJ, Dalir, H & Sorger, VJ 2018, 110 Attojoule-per-bit efficient graphene-based plasmon modulator on Silicon. in CLEO: Science and Innovations, CLEO_SI 2018. Optics InfoBase Conference Papers, vol. Part F94-CLEO_SI 2018, Optica Publishing Group (formerly OSA), CLEO: Science and Innovations, CLEO_SI 2018, San Jose, United States, 18/5/13. https://doi.org/10.1364/CLEO_SI.2018.SM1I.5

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title = "110 Attojoule-per-bit efficient graphene-based plasmon modulator on Silicon",

abstract = "We demonstrate a plasmonic Graphene-based electro-absorption modulator heterogeneously integrated in Silicon photonics consuming 110 aJ/bit and being 15 μm compact. We show how the plasmonic metal enables steep switching via improved contact resistance.",

author = "Rubab Amin and Sikandar Khan and Lee, {Cheol J.} and Hamed Dalir and Sorger, {Volker J.}",

note = "Publisher Copyright: {\textcopyright} OSA 2018.; CLEO: Science and Innovations, CLEO_SI 2018 ; Conference date: 13-05-2018 Through 18-05-2018",

year = "2018",

doi = "10.1364/CLEO_SI.2018.SM1I.5",

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AU - Sorger, Volker J.

PY - 2018

Y1 - 2018

N2 - We demonstrate a plasmonic Graphene-based electro-absorption modulator heterogeneously integrated in Silicon photonics consuming 110 aJ/bit and being 15 μm compact. We show how the plasmonic metal enables steep switching via improved contact resistance.

AB - We demonstrate a plasmonic Graphene-based electro-absorption modulator heterogeneously integrated in Silicon photonics consuming 110 aJ/bit and being 15 μm compact. We show how the plasmonic metal enables steep switching via improved contact resistance.

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M3 - Conference contribution

AN - SCOPUS:85048959716

SN - 9781943580422

T3 - Optics InfoBase Conference Papers

BT - CLEO

PB - Optica Publishing Group (formerly OSA)

T2 - CLEO: Science and Innovations, CLEO_SI 2018

Y2 - 13 May 2018 through 18 May 2018

ER -

110 Attojoule-per-bit efficient graphene-based plasmon modulator on Silicon

Abstract

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Bibliographical note

ASJC Scopus subject areas

Access to Document

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