110 Attojoule-per-bit Efficient Graphene-based Plasmon Modulator on Silicon

Rubab Amin, Sikandar Khan, Cheol J. Lee, Hamed Dalir, Volker J. Sorger

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

We demonstrate a plasmonic Graphene-based electro-absorption modulator heterogeneously integrated in Silicon photonics consuming 110 aJ/bit and being 15 μm compact. We show how the plasmonic metal enables steep switching via improved contact resistance.

Original languageEnglish
Title of host publication2018 Conference on Lasers and Electro-Optics, CLEO 2018 - Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Print)9781943580422
Publication statusPublished - 2018 Aug 6
Event2018 Conference on Lasers and Electro-Optics, CLEO 2018 - San Jose, United States
Duration: 2018 May 132018 May 18

Publication series

Name2018 Conference on Lasers and Electro-Optics, CLEO 2018 - Proceedings

Other

Other2018 Conference on Lasers and Electro-Optics, CLEO 2018
Country/TerritoryUnited States
CitySan Jose
Period18/5/1318/5/18

Bibliographical note

Publisher Copyright:
© 2018 OSA.

ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Fingerprint

Dive into the research topics of '110 Attojoule-per-bit Efficient Graphene-based Plasmon Modulator on Silicon'. Together they form a unique fingerprint.

Cite this