2-Dimensional analysis of plasma ashing damage induced by oxygen-based plasmas along nanopores in SiOCH film for a nanoscale back-end of line process

Gwang Sik Kim, Sun Woo Kim, Hwan Jun Zang, Minwoo Ha, Sang Soo Park, Choon Hwan Kim, Hyun Yong Yu

Research output: Contribution to journal › Article › peer-review

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