@inproceedings{427ce596cf8b476db188ee40a6de3383,
title = "2D photonic crystal TM polarizer fabricated by one-step combined nanoimprint and photolithography",
abstract = "Photonic crystal has been widely investigated since it has a great potential to manipulate the flow of light in ultra compact scale. 2D slab photonic crystals for telecommunication wavelengths (e.g., 1550 nm) have multi-scale structures which are typically micron scale waveguides and deep sub-micron scale air-hole array. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. Such a multi-step lithography process increases fabrication complexity. In this work, we report one-step lithography process to pattern both micron and deep sub-micron features simultaneously using combined-nanoimprint- and-photolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated and characterized.",
keywords = "Photonic crystals, hybrid mask mold, nanoimprint lithography, photolithography",
author = "Choi, {K. H.} and J. Huh and Y. Cui and Ju, {B. K.} and W. Hu and Lee, {J. B.}",
year = "2011",
doi = "10.1109/TRANSDUCERS.2011.5969813",
language = "English",
isbn = "9781457701573",
series = "2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11",
pages = "1638--1641",
booktitle = "2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11",
note = "2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11 ; Conference date: 05-06-2011 Through 09-06-2011",
}