Abstract
In this study, top-gate ZnO nanowire field-effect transistors (FETs) were successfully fabricated using a photolithography process, and their electrical properties were characterized by I-V measurements. Their electrical characteristics were compared with those of back-gate ZnO nanowire FETs. The fabricated nanowire FETs exhibit good contact between the ZnO nanowire channels and Ti metal electrodes. A representative top-gate FET showed a higher gate dependence than a representative back-gate FET; the peak transconductances of the back- and top-gate FETs were 19 nS and 248 nS, respectively. These characteristics reveal that the top-gate nanowire FET fabricated by the photolithography process has better performance. The fabrication technique used for the nanowire FETs by a photolithography process in this study is applicable to the fabrication of various devices including TFTs, memory devices, photodetectors, and so on.
Original language | English |
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Pages (from-to) | 1622-1626 |
Number of pages | 5 |
Journal | Microelectronic Engineering |
Volume | 84 |
Issue number | 5-8 |
DOIs | |
Publication status | Published - 2007 May |
Keywords
- FET
- Fabrication
- Nanowire
- Photolithography
- Top-gate
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering