A fabrication technique for top-gate ZnO nanowire field-effect transistors by a photolithography process

Kihyun Keem, Jeongmin Kang, Changjoon Yoon, Donghyuk Yeom, Dong Young Jeong, Byung Moo Moon, Sangsig Kim

Research output: Contribution to journalArticlepeer-review

26 Citations (Scopus)


In this study, top-gate ZnO nanowire field-effect transistors (FETs) were successfully fabricated using a photolithography process, and their electrical properties were characterized by I-V measurements. Their electrical characteristics were compared with those of back-gate ZnO nanowire FETs. The fabricated nanowire FETs exhibit good contact between the ZnO nanowire channels and Ti metal electrodes. A representative top-gate FET showed a higher gate dependence than a representative back-gate FET; the peak transconductances of the back- and top-gate FETs were 19 nS and 248 nS, respectively. These characteristics reveal that the top-gate nanowire FET fabricated by the photolithography process has better performance. The fabrication technique used for the nanowire FETs by a photolithography process in this study is applicable to the fabrication of various devices including TFTs, memory devices, photodetectors, and so on.

Original languageEnglish
Pages (from-to)1622-1626
Number of pages5
JournalMicroelectronic Engineering
Issue number5-8
Publication statusPublished - 2007 May

Bibliographical note

Funding Information:
This study was supported by the National Research Program for the 0.1 Terabit Non-Volatile Memory Development (10022965-2005-11), National Research Laboratory (M10500000045-05J0000-04510), National R&D Project for Nano Science and Technology (10022916-2005-21), Center for Integrated-Nano-Systems (CINS) of Korea Research Foundation (KRF-2005-005-D00087).


  • FET
  • Fabrication
  • Nanowire
  • Photolithography
  • Top-gate

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


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