A low-noise silicon nitride nanopore device on a polymer substrate

Wook Choi; Eun Seok Jeon; Kyoung Yong Chun; Young Rok Kim; Kyeong Beom Park; Ki Bum Kim; Chang Soo Han

doi:10.1371/journal.pone.0200831

A low-noise silicon nitride nanopore device on a polymer substrate

Wook Choi, Eun Seok Jeon, Kyoung Yong Chun, Young Rok Kim, Kyeong Beom Park, Ki Bum Kim, Chang Soo Han

Research output: Contribution to journal › Article › peer-review

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Abstract

We report a novel low-noise nanopore device employing a polymer substrate. The Si substrate of a fabricated Si-substrate-based silicon nitride (Si₃N₄) membrane was replaced with a polymer substrate. As such, laser machining was used to make a micro-size hole through the polyimide (PI) substrate, and a thin Si₃N₄ membrane was then transferred onto the PI substrate. Finally, a nanopore was formed in the membrane using a transmission electron microscope for detection of biomolecules. Compared to the Si-substrate-based device, the dielectric noise was greatly reduced and the root-mean-square noise level was decreased from 146.7 to 5.4 pA. Using this device, the translocation of double-strand deoxyribonucleic acid (DNA) was detected with a high signal/noise (S/N) ratio. This type of device is anticipated to be available for future versatile sequencing technologies.

Original language	English
Article number	e0200831
Journal	PloS one
Volume	13
Issue number	7
DOIs	https://doi.org/10.1371/journal.pone.0200831
Publication status	Published - 2018 Jul

Bibliographical note

Funding Information:
This work was supported by Basic Science Research Program (Grant no. NRF-2018R1A2A1A05023556) and ERC Program (Grant no. NRF-2016R1A5A1010148) through the National Research Foundation of Korea funded by the Ministry of Science, ICT and Future Planning in Korea. This work was supported by Basic Science Research Program (Grant no. NRF-2018R1A2A1A05023556) and ERC Program (Grant no. NRF-2016R1A5A1010148) through the National Research Foundation of Korea funded by the Ministry of Science, ICT and Future Planning in Korea. We thank Dr. Hionsuck Baik and KBSI for the support of HR-TEM.

Publisher Copyright:
© 2018 Choi et al. This is an open access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.

ASJC Scopus subject areas

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@article{d9fb8dc03adb4f1fa72cf47fd90bd959,

title = "A low-noise silicon nitride nanopore device on a polymer substrate",

abstract = "We report a novel low-noise nanopore device employing a polymer substrate. The Si substrate of a fabricated Si-substrate-based silicon nitride (Si3N4) membrane was replaced with a polymer substrate. As such, laser machining was used to make a micro-size hole through the polyimide (PI) substrate, and a thin Si3N4 membrane was then transferred onto the PI substrate. Finally, a nanopore was formed in the membrane using a transmission electron microscope for detection of biomolecules. Compared to the Si-substrate-based device, the dielectric noise was greatly reduced and the root-mean-square noise level was decreased from 146.7 to 5.4 pA. Using this device, the translocation of double-strand deoxyribonucleic acid (DNA) was detected with a high signal/noise (S/N) ratio. This type of device is anticipated to be available for future versatile sequencing technologies.",

author = "Wook Choi and Jeon, {Eun Seok} and Chun, {Kyoung Yong} and Kim, {Young Rok} and Park, {Kyeong Beom} and Kim, {Ki Bum} and Han, {Chang Soo}",

note = "Funding Information: This work was supported by Basic Science Research Program (Grant no. NRF-2018R1A2A1A05023556) and ERC Program (Grant no. NRF-2016R1A5A1010148) through the National Research Foundation of Korea funded by the Ministry of Science, ICT and Future Planning in Korea. This work was supported by Basic Science Research Program (Grant no. NRF-2018R1A2A1A05023556) and ERC Program (Grant no. NRF-2016R1A5A1010148) through the National Research Foundation of Korea funded by the Ministry of Science, ICT and Future Planning in Korea. We thank Dr. Hionsuck Baik and KBSI for the support of HR-TEM. Publisher Copyright: {\textcopyright} 2018 Choi et al. This is an open access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.",

year = "2018",

month = jul,

doi = "10.1371/journal.pone.0200831",

language = "English",

volume = "13",

journal = "PloS one",

issn = "1932-6203",

publisher = "Public Library of Science",

number = "7",

}

TY - JOUR

T1 - A low-noise silicon nitride nanopore device on a polymer substrate

AU - Choi, Wook

AU - Jeon, Eun Seok

AU - Chun, Kyoung Yong

AU - Kim, Young Rok

AU - Park, Kyeong Beom

AU - Kim, Ki Bum

AU - Han, Chang Soo

N1 - Funding Information: This work was supported by Basic Science Research Program (Grant no. NRF-2018R1A2A1A05023556) and ERC Program (Grant no. NRF-2016R1A5A1010148) through the National Research Foundation of Korea funded by the Ministry of Science, ICT and Future Planning in Korea. This work was supported by Basic Science Research Program (Grant no. NRF-2018R1A2A1A05023556) and ERC Program (Grant no. NRF-2016R1A5A1010148) through the National Research Foundation of Korea funded by the Ministry of Science, ICT and Future Planning in Korea. We thank Dr. Hionsuck Baik and KBSI for the support of HR-TEM. Publisher Copyright: © 2018 Choi et al. This is an open access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.

PY - 2018/7

Y1 - 2018/7

N2 - We report a novel low-noise nanopore device employing a polymer substrate. The Si substrate of a fabricated Si-substrate-based silicon nitride (Si3N4) membrane was replaced with a polymer substrate. As such, laser machining was used to make a micro-size hole through the polyimide (PI) substrate, and a thin Si3N4 membrane was then transferred onto the PI substrate. Finally, a nanopore was formed in the membrane using a transmission electron microscope for detection of biomolecules. Compared to the Si-substrate-based device, the dielectric noise was greatly reduced and the root-mean-square noise level was decreased from 146.7 to 5.4 pA. Using this device, the translocation of double-strand deoxyribonucleic acid (DNA) was detected with a high signal/noise (S/N) ratio. This type of device is anticipated to be available for future versatile sequencing technologies.

AB - We report a novel low-noise nanopore device employing a polymer substrate. The Si substrate of a fabricated Si-substrate-based silicon nitride (Si3N4) membrane was replaced with a polymer substrate. As such, laser machining was used to make a micro-size hole through the polyimide (PI) substrate, and a thin Si3N4 membrane was then transferred onto the PI substrate. Finally, a nanopore was formed in the membrane using a transmission electron microscope for detection of biomolecules. Compared to the Si-substrate-based device, the dielectric noise was greatly reduced and the root-mean-square noise level was decreased from 146.7 to 5.4 pA. Using this device, the translocation of double-strand deoxyribonucleic acid (DNA) was detected with a high signal/noise (S/N) ratio. This type of device is anticipated to be available for future versatile sequencing technologies.

UR - http://www.scopus.com/inward/record.url?scp=85051824070&partnerID=8YFLogxK

U2 - 10.1371/journal.pone.0200831

DO - 10.1371/journal.pone.0200831

M3 - Article

C2 - 30028848

AN - SCOPUS:85051824070

SN - 1932-6203

VL - 13

JO - PloS one

JF - PloS one

IS - 7

M1 - e0200831

ER -

A low-noise silicon nitride nanopore device on a polymer substrate

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