A low-noise silicon nitride nanopore device on a polymer substrate

Wook Choi, Eun Seok Jeon, Kyoung Yong Chun, Young Rok Kim, Kyeong Beom Park, Ki Bum Kim, Chang Soo Han

    Research output: Contribution to journalArticlepeer-review

    13 Citations (Scopus)

    Abstract

    We report a novel low-noise nanopore device employing a polymer substrate. The Si substrate of a fabricated Si-substrate-based silicon nitride (Si3N4) membrane was replaced with a polymer substrate. As such, laser machining was used to make a micro-size hole through the polyimide (PI) substrate, and a thin Si3N4 membrane was then transferred onto the PI substrate. Finally, a nanopore was formed in the membrane using a transmission electron microscope for detection of biomolecules. Compared to the Si-substrate-based device, the dielectric noise was greatly reduced and the root-mean-square noise level was decreased from 146.7 to 5.4 pA. Using this device, the translocation of double-strand deoxyribonucleic acid (DNA) was detected with a high signal/noise (S/N) ratio. This type of device is anticipated to be available for future versatile sequencing technologies.

    Original languageEnglish
    Article numbere0200831
    JournalPloS one
    Volume13
    Issue number7
    DOIs
    Publication statusPublished - 2018 Jul

    Bibliographical note

    Publisher Copyright:
    © 2018 Choi et al. This is an open access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.

    ASJC Scopus subject areas

    • General

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