Keyphrases
Silica
100%
Si Substrate
100%
Low Threshold
100%
Continuous-wave Operation
100%
Nanobeam
100%
Transfer Printing
40%
Room Temperature
20%
Low Power Consumption
20%
Printing Process
20%
Ultra-compact
20%
Photonic Integrated Circuits
20%
Small Footprint
20%
Lasing Threshold
20%
Dry Transfer
20%
Single-mode Lasing
20%
Photonic Crystal Laser
20%
Adhesive Materials
20%
Next Generation Light Source
20%
Threshold Power
20%
Efficient Heat Dissipation
20%
InGaAsP Materials
20%
Engineering
Si Substrate
100%
Continuous Wave
100%
Silicon Dioxide
100%
Photonics
66%
Room Temperature
33%
Heat Losses
33%
Printing Process
33%
Low Power Consumption
33%
Light Source
33%
Lasing Mode
33%
Promising Candidate
33%
Integrated Circuit
33%
Material Science
Electronic Circuit
100%
Photonic Crystal
100%