A reduced model for nanoparticle coating in non-equilibrium plasma

B. Rovagnati, A. L. Yarin, F. Mashayek, T. Matsoukas

Research output: Contribution to journalArticlepeer-review


In this Letter, a reduced model is developed based on the full model presented earlier [Yarin et al., J. Appl. Phys. 99 (6) (2006) 064310] for the deposition of amorphous hydrogenated carbon onto particles in a methane-hydrogen plasma. The reduced model is developed based on the assumption that, under certain conditions, chemistry may be decoupled from transport. The results from the reduced model are compared to the results from the full model for particle charge and growth rate of the deposited layer. It is shown that the two models are in good agreement for submicron particles that are of interest in nanoparticle coating in low-pressure plasma reactors. The reduced model is computationally far less expensive as compared to the full model and can be implemented for simulation of a large number of nanoparticles in plasma reactors.

Original languageEnglish
Pages (from-to)1745-1748
Number of pages4
JournalPhysics Letters, Section A: General, Atomic and Solid State Physics
Issue number28-30
Publication statusPublished - 2013 Oct 15

Bibliographical note

Funding Information:
This work was supported by grant CBET-0651362 from the U.S. National Science Foundation .

Copyright 2020 Elsevier B.V., All rights reserved.


  • Dusty plasma
  • Low-pressure plasma
  • Nanoparticle coating
  • Reduced model

ASJC Scopus subject areas

  • General Physics and Astronomy


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