A simple and fast fabrication of a both self-cleanable and deep-UV antireflective quartz nanostructured surface

Jung Suk Kim, Hyun Woo Jeong, Wonbae Lee, Bo Gi Park, Beop Min Kim, Kyu Back Lee

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Both self-cleanability and antireflectivity were achieved on quartz surfaces by forming heptadecafluoro-1, 1, 2, 2-tetrahydrodecyltrichlorosilane self-assembled monolayer after fabrication of nanostructures with a mask-free method. By exposing polymethylmethacrylate spin-coated quartz plates to O2 reactive ion etching (RIE) and CF4 RIE successively, three well-defined types of nanopillar arrays were generated: A2, A8, and A11 patterns with average pillar widths of 33 ± 4 nm, 55 ± 5 nm, and 73 ± 14 nm, respectively, were formed. All the fabrication processes including the final cleaning can be finished within 4 h. All nanostructured quartz surfaces exhibited contact angles higher than 155° with minimal water droplet adhesiveness and enhanced transparency (due to antireflectivity) over a broad spectral range from 350 to 900 nm. Furthermore, A2 pattern showed an enhanced antireflective effect that extends to the deep-UV range near 190 nm, which is a drawback region in conventional thin-film-coating approaches as a result of thermal damage. Because, by changing the conditions of successive RIE, the geometrical configurations of nanostructure arrays can be easily modified to meet specific needs, the newly developed fabrication method is expected to be applied in various optic and opto-electrical areas.

Original languageEnglish
Article number430
JournalNanoscale Research Letters
Volume7
DOIs
Publication statusPublished - 2012 Aug 1

Bibliographical note

Funding Information:
This study was supported in part by the National Research Foundation of Korea (NRF) grant funded by the Korean government (MEST) (no. 210– 0014693), the Seoul R&BD Program (10920), the Korea Science and Engineering Foundation through the Pioneer Converging Technology Program (no. M1071160001-08 M1116-00110), and by a grant of the Korea Healthcare Technology R&D Project, Ministry of Health, Welfare & Family Affair, Republic of Korea (A084204). This study was also supported by a grant from the Korean Health Technology R&D Project, Ministry for Health, Welfare & Family Affairs (A102024) and a grant (20110027241) from the Basic Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology, Republic of Korea.

Keywords

  • Antireflection
  • Deep-UV
  • Mask-free
  • Nanostructure
  • Superhydrophobicity

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics

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