A study of the role of HBr and oxygen on the etch selectivity and the post-etch profile in a polysilicon/oxide etch using HBr/O2 based high density plasma for advanced DRAMs

Deok kee Kim, Young Keun Kim, Heon Lee

Research output: Contribution to journal › Article › peer-review

24 Citations (Scopus)

Fingerprint

Dive into the research topics of 'A study of the role of HBr and oxygen on the etch selectivity and the post-etch profile in a polysilicon/oxide etch using HBr/O2 based high density plasma for advanced DRAMs'. Together they form a unique fingerprint.

Keyphrases

Chemical Engineering