Activated calcium silicate thinfilm by He plasma treatments

Inho Han; Hong Koo Baik; Sang Wan Shin; In Seop Lee

doi:10.1016/j.surfcoat.2008.06.081

Activated calcium silicate thinfilm by He plasma treatments

Inho Han
, Hong Koo Baik
, Sang Wan Shin
, In Seop Lee^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

Calcium phosphate forming ability of thin calcium silicates film formed by electron-beam evaporation has been reported. Increasing calcium concentration in calcium silicates is necessary to provide high bioactivity, but there is limitation due to mechanical strength. In this paper, plasma treatment was proposed as post-treatment process for calcium silicate thinfilm to acquire high bioactivity. Thinfilm of calcium silicate was synthesized on titanium coated silicon wafer by means of electron-beam evaporation, and then annealed at 400 °C in air prior to helium atmospheric pressure dielectric barrier discharge (He-AP-DBD) treatment. He-AP-DBD treatment introduced hydrophilic surface with hydroxyl functional group on calcium silicate surface, and calcium phosphate formation was accelerated in phosphate buffered saline (PBS) containing CaCl₂.

Original language	English
Pages (from-to)	5746-5749
Number of pages	4
Journal	Surface and Coatings Technology
Volume	202
Issue number	22-23
DOIs	https://doi.org/10.1016/j.surfcoat.2008.06.081
Publication status	Published - 2008 Aug 30

Bibliographical note

Funding Information:
This work was supported by a grant (code #: 08K1501-01220) from the Center for Nanostructured Materials Technology under 21st Century Frontier R&D Program of the Ministry of Science and Technology, Korea.

Keywords

Bioglass
Calcium silicate
DBD
Plasma treatment
e-beam evaporation

ASJC Scopus subject areas

General Chemistry
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/j.surfcoat.2008.06.081

Cite this

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title = "Activated calcium silicate thinfilm by He plasma treatments",

abstract = "Calcium phosphate forming ability of thin calcium silicates film formed by electron-beam evaporation has been reported. Increasing calcium concentration in calcium silicates is necessary to provide high bioactivity, but there is limitation due to mechanical strength. In this paper, plasma treatment was proposed as post-treatment process for calcium silicate thinfilm to acquire high bioactivity. Thinfilm of calcium silicate was synthesized on titanium coated silicon wafer by means of electron-beam evaporation, and then annealed at 400 °C in air prior to helium atmospheric pressure dielectric barrier discharge (He-AP-DBD) treatment. He-AP-DBD treatment introduced hydrophilic surface with hydroxyl functional group on calcium silicate surface, and calcium phosphate formation was accelerated in phosphate buffered saline (PBS) containing CaCl2.",

keywords = "Bioglass, Calcium silicate, DBD, Plasma treatment, e-beam evaporation",

author = "Inho Han and Baik, \{Hong Koo\} and Shin, \{Sang Wan\} and Lee, \{In Seop\}",

note = "Funding Information: This work was supported by a grant (code \#: 08K1501-01220) from the Center for Nanostructured Materials Technology under 21st Century Frontier R\&D Program of the Ministry of Science and Technology, Korea.",

year = "2008",

month = aug,

day = "30",

doi = "10.1016/j.surfcoat.2008.06.081",

language = "English",

volume = "202",

pages = "5746--5749",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

number = "22-23",

}

TY - JOUR

T1 - Activated calcium silicate thinfilm by He plasma treatments

AU - Han, Inho

AU - Baik, Hong Koo

AU - Shin, Sang Wan

AU - Lee, In Seop

N1 - Funding Information: This work was supported by a grant (code #: 08K1501-01220) from the Center for Nanostructured Materials Technology under 21st Century Frontier R&D Program of the Ministry of Science and Technology, Korea.

PY - 2008/8/30

Y1 - 2008/8/30

N2 - Calcium phosphate forming ability of thin calcium silicates film formed by electron-beam evaporation has been reported. Increasing calcium concentration in calcium silicates is necessary to provide high bioactivity, but there is limitation due to mechanical strength. In this paper, plasma treatment was proposed as post-treatment process for calcium silicate thinfilm to acquire high bioactivity. Thinfilm of calcium silicate was synthesized on titanium coated silicon wafer by means of electron-beam evaporation, and then annealed at 400 °C in air prior to helium atmospheric pressure dielectric barrier discharge (He-AP-DBD) treatment. He-AP-DBD treatment introduced hydrophilic surface with hydroxyl functional group on calcium silicate surface, and calcium phosphate formation was accelerated in phosphate buffered saline (PBS) containing CaCl2.

AB - Calcium phosphate forming ability of thin calcium silicates film formed by electron-beam evaporation has been reported. Increasing calcium concentration in calcium silicates is necessary to provide high bioactivity, but there is limitation due to mechanical strength. In this paper, plasma treatment was proposed as post-treatment process for calcium silicate thinfilm to acquire high bioactivity. Thinfilm of calcium silicate was synthesized on titanium coated silicon wafer by means of electron-beam evaporation, and then annealed at 400 °C in air prior to helium atmospheric pressure dielectric barrier discharge (He-AP-DBD) treatment. He-AP-DBD treatment introduced hydrophilic surface with hydroxyl functional group on calcium silicate surface, and calcium phosphate formation was accelerated in phosphate buffered saline (PBS) containing CaCl2.

KW - Bioglass

KW - Calcium silicate

KW - DBD

KW - Plasma treatment

KW - e-beam evaporation

UR - https://www.scopus.com/pages/publications/50349094461

U2 - 10.1016/j.surfcoat.2008.06.081

DO - 10.1016/j.surfcoat.2008.06.081

M3 - Article

AN - SCOPUS:50349094461

SN - 0257-8972

VL - 202

SP - 5746

EP - 5749

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 22-23

ER -

Activated calcium silicate thinfilm by He plasma treatments

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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