Abstract
This paper proposes a novel highly accurate virtual metrology (VM) method based on adaptive online time-series learning. The method comprises a novel time-series prediction algorithm robust against data drifts and shifts observed in semi-conductor manufacturing. The prediction algorithm incorporates time-aware data normalization and adaptive online learning. The time-aware normalizer transforms the data to suppress the effect of drifts. The adaptive online learner captures the time-varying relationship between response and inputs caused by shifts. On both simulated and real process data our approach outperforms conventional VM approaches. When applied to advanced process control (APC) on high-volume production lines at a major semiconductor manufacturer, our VM method substantially reduced variability of process outcomes.
Original language | English |
---|---|
Title of host publication | 2023 34th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2023 |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
ISBN (Electronic) | 9781665456395 |
DOIs | |
Publication status | Published - 2023 |
Event | 34th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2023 - Saratoga Springs, United States Duration: 2023 May 1 → 2023 May 4 |
Publication series
Name | ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings |
---|---|
Volume | 2023-May |
ISSN (Print) | 1078-8743 |
Conference
Conference | 34th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2023 |
---|---|
Country/Territory | United States |
City | Saratoga Springs |
Period | 23/5/1 → 23/5/4 |
Bibliographical note
Publisher Copyright:© 2023 IEEE.
Keywords
- adaptive learning algorithm
- advanced process control (APC)
- data drifts and shifts
- time-series prediction
- virtual metrology (VM)
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- General Engineering
- Industrial and Manufacturing Engineering
- Electrical and Electronic Engineering