Advanced semiconductor fabrication process control using dual filter exponentially weighted moving average

Hyo Heon Ko; Jihyun Kim; Sang Hoon Park; Jun Geol Baek; Sung Shick Kim

doi:10.1007/s10845-010-0383-6

Advanced semiconductor fabrication process control using dual filter exponentially weighted moving average

Hyo Heon Ko, Jihyun Kim, Sang Hoon Park, Jun Geol Baek, Sung Shick Kim

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

Semiconductor industry needs to meet high standards to ensure survival and success in the 21st century. Rising expectations from the customers are demanding the semiconductor industry to manufacture products with both accuracy and precision. To comply with the strict demands, an effective control method for semiconductor manufacturing is introduced. The process environment is afflicted by process disturbances. Different characteristics of the process disturbances require the controlmethod to be able to respond accordingly. This study utilizes two separate exponentially weighted moving average (EWMA) filters simultaneously to improve the performance of the control method. By utilizing dual filters, the influence of the white noise is reduced and the accurate process control is made possible. The proposed methodology is evaluated through simulation in comparison with two other control methods.

Original language	English
Pages (from-to)	443-455
Number of pages	13
Journal	Journal of Intelligent Manufacturing
Volume	23
Issue number	3
DOIs	https://doi.org/10.1007/s10845-010-0383-6
Publication status	Published - 2012 Jun

Bibliographical note

Funding Information:
Acknowledgments This work is financially supported by Ministry of Knowledge Economy (10031812-2008-11). The present research has been conducted by the Research Grant of Kwangwoon University in 2009.

Keywords

Dual filter EWMA
EWMA
Process control
Run-to-run
Semiconductor fabrication process

ASJC Scopus subject areas

Software
Industrial and Manufacturing Engineering
Artificial Intelligence

Access to Document

10.1007/s10845-010-0383-6

Cite this

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title = "Advanced semiconductor fabrication process control using dual filter exponentially weighted moving average",

abstract = "Semiconductor industry needs to meet high standards to ensure survival and success in the 21st century. Rising expectations from the customers are demanding the semiconductor industry to manufacture products with both accuracy and precision. To comply with the strict demands, an effective control method for semiconductor manufacturing is introduced. The process environment is afflicted by process disturbances. Different characteristics of the process disturbances require the controlmethod to be able to respond accordingly. This study utilizes two separate exponentially weighted moving average (EWMA) filters simultaneously to improve the performance of the control method. By utilizing dual filters, the influence of the white noise is reduced and the accurate process control is made possible. The proposed methodology is evaluated through simulation in comparison with two other control methods.",

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AU - Kim, Jihyun

AU - Park, Sang Hoon

AU - Baek, Jun Geol

AU - Kim, Sung Shick

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AB - Semiconductor industry needs to meet high standards to ensure survival and success in the 21st century. Rising expectations from the customers are demanding the semiconductor industry to manufacture products with both accuracy and precision. To comply with the strict demands, an effective control method for semiconductor manufacturing is introduced. The process environment is afflicted by process disturbances. Different characteristics of the process disturbances require the controlmethod to be able to respond accordingly. This study utilizes two separate exponentially weighted moving average (EWMA) filters simultaneously to improve the performance of the control method. By utilizing dual filters, the influence of the white noise is reduced and the accurate process control is made possible. The proposed methodology is evaluated through simulation in comparison with two other control methods.

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Advanced semiconductor fabrication process control using dual filter exponentially weighted moving average

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

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