An analytical model of reactive diffusion for transient electronics

Rui Li, Huanyu Cheng, Yewang Su, Suk Won Hwang, Lan Yin, Hu Tao, Mark A. Brenckle, Dae Hyeong Kim, Fiorenzo G. Omenetto, John A. Rogers, Yonggang Huang

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Material Science

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Chemical Engineering

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