Abstract
An integrated Mach-Zehnder interferometric chip operating at 632. 8 nm was designed and fabricated using planar rib waveguide technology for optical sensor applications. A rib waveguide with a silicon-oxynitride core layer and silicon-oxide clad layers was geometrically designed to have a singlemode operation and a high surface sensitivity by using an effective index method. A chromium mask layer was employed as an etch stop to protect the core layer of the rib waveguide and was patterned using an image reversal process with a photo mask applied to the sensor zone. The image reversal process was modified in order to obtain a longer chromium mask layer against the sensor zone. We have, therefore, established a fabrication method for an integrated Mach-Zehnder interferometric sensor without the addition of a new photo mask. The optical measurement with this device for a mixture of deionized water (DIW) and phosphate buffer solution (PBS) finally showed a sensitivity of about π/(6.25 × 10 -4).
| Original language | English |
|---|---|
| Pages (from-to) | 744-749 |
| Number of pages | 6 |
| Journal | Journal of the Korean Physical Society |
| Volume | 60 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 2012 Mar |
Bibliographical note
Funding Information:This work was supported, in part, by a Korea University Grant (T0702661), a Korea Institute of Science and Technology (KIST) Basic Research Grant, and a Seoul R&BD Program (WR080951). This work was also sup- ported by Basic Science Research Program through the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (2010-0013097).
Keywords
- Chromium mask layer
- Image reversal process
- Mach-Zehnder interferometric chip
- Rib waveguide
- Silicon-oxynitride
ASJC Scopus subject areas
- General Physics and Astronomy