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Analysis of the negative charges injected into a SiO2/SiNx stack using plasma charging technology for field-effect passivation on a boron-doped silicon surface

  • Kwan Hong Min
  • , Jeong Mo Hwang
  • , Eunwan Cho
  • , Hee eun Song
  • , Sungeun Park
  • , Ajeet Rohatgi
  • , Donghwan Kim
  • , Hae Seok Lee
  • , Yoonmook Kang*
  • , Young Woo Ok*
  • , Min Gu Kang*
    • *Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

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