Assessment of dry etching damage in permalloy thin films

S. D. Kim; J. J. Lee; S. H. Lim; H. J. Kim

doi:10.1063/1.370014

Assessment of dry etching damage in permalloy thin films

S. D. Kim, J. J. Lee, S. H. Lim, H. J. Kim

Research output: Contribution to journal › Conference article › peer-review

18 Citations (Scopus)

Abstract

Surface damage due to etching was investigated in permalloy (Ni₈₁Fe₁₉) thin films. The films were etched by ion beam etching or reactive ion etching and changes in magnetic properties with etching time was investigated. Low energy ion bombardment affected the soft magnetic properties of the films, leading to consequent deterioration of the magnetic softness.

Original language	English
Pages (from-to)	5992-5994
Number of pages	3
Journal	Journal of Applied Physics
Volume	85
Issue number	8 II B
DOIs	https://doi.org/10.1063/1.370014
Publication status	Published - 1999 Apr 15
Externally published	Yes
Event	Proceedings of the 43rd Annual Conference on Magnetism and Magnetic Materials - Miami, FL, USA Duration: 1998 Nov 9 → 1998 Nov 12

ASJC Scopus subject areas

General Physics and Astronomy

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10.1063/1.370014

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title = "Assessment of dry etching damage in permalloy thin films",

abstract = "Surface damage due to etching was investigated in permalloy (Ni81Fe19) thin films. The films were etched by ion beam etching or reactive ion etching and changes in magnetic properties with etching time was investigated. Low energy ion bombardment affected the soft magnetic properties of the films, leading to consequent deterioration of the magnetic softness.",

author = "Kim, {S. D.} and Lee, {J. J.} and Lim, {S. H.} and Kim, {H. J.}",

year = "1999",

month = apr,

day = "15",

doi = "10.1063/1.370014",

language = "English",

volume = "85",

pages = "5992--5994",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "8 II B",

note = "Proceedings of the 43rd Annual Conference on Magnetism and Magnetic Materials ; Conference date: 09-11-1998 Through 12-11-1998",

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T1 - Assessment of dry etching damage in permalloy thin films

AU - Kim, S. D.

AU - Lee, J. J.

AU - Lim, S. H.

AU - Kim, H. J.

PY - 1999/4/15

Y1 - 1999/4/15

N2 - Surface damage due to etching was investigated in permalloy (Ni81Fe19) thin films. The films were etched by ion beam etching or reactive ion etching and changes in magnetic properties with etching time was investigated. Low energy ion bombardment affected the soft magnetic properties of the films, leading to consequent deterioration of the magnetic softness.

AB - Surface damage due to etching was investigated in permalloy (Ni81Fe19) thin films. The films were etched by ion beam etching or reactive ion etching and changes in magnetic properties with etching time was investigated. Low energy ion bombardment affected the soft magnetic properties of the films, leading to consequent deterioration of the magnetic softness.

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U2 - 10.1063/1.370014

DO - 10.1063/1.370014

M3 - Conference article

AN - SCOPUS:0032620964

SN - 0021-8979

VL - 85

SP - 5992

EP - 5994

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 8 II B

T2 - Proceedings of the 43rd Annual Conference on Magnetism and Magnetic Materials

Y2 - 9 November 1998 through 12 November 1998

ER -

Assessment of dry etching damage in permalloy thin films

Abstract

ASJC Scopus subject areas

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