Abstract
We have investigated the evolution of surface morphology with thin-film growth of polystyrene (PS)-polyisoprene (PI) diblock copolymer and fabrication of polymer nano-template by atomic force microscopy (AFM). Well-controlled (PS-b-PI) diblock copolymer (PI weight fraction = 0.16, Mw = 85000, and Mw/Mn = 1.01) was prepared by living anionic polymerization. Spin coated copolymer film on both the hydrophobic Si and hydrophilic oxide and nitride substrates showed a typical layer-by-layer growth mode. The (PS-b-PI) diblock copolymer film became spontaneously ordered after overnight annealing inside a vacuum oven above their glass transition temperature, giving hexagonal-close-packed (hep) phase of PI spheres. The well-controlled monolayer film was selectively etched via ozonation to obtain PI sphere voids and then subsequently reacted with CF4+ ions to etch the PS matrix. We obtained the AFM image of the surface morphology of such formed polymer template, whose pattern consisted of 20-nm-size spheres with a periodicity of 45 nm.
Original language | English |
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Pages (from-to) | 762-766 |
Number of pages | 5 |
Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
Volume | 43 |
Issue number | 2 |
DOIs | |
Publication status | Published - 2004 Feb |
Keywords
- Atomic force microscopy
- Block copolymer
- Microphase separation
- Nanotemplate
- Self-assembly
ASJC Scopus subject areas
- General Engineering
- General Physics and Astronomy