Atomic Force Microscopy Study of the Polymeric Nanotemplate Fabricated via a Microphase Separation and Subsequent Selective Etching of (PS-b-PI) Copolymer Thin Film

Jonghyurk Park, Jeong Sook Ha, Jinsook Ryu, Taihyun Chano

    Research output: Contribution to journalArticlepeer-review

    1 Citation (Scopus)

    Abstract

    We have investigated the evolution of surface morphology with thin-film growth of polystyrene (PS)-polyisoprene (PI) diblock copolymer and fabrication of polymer nano-template by atomic force microscopy (AFM). Well-controlled (PS-b-PI) diblock copolymer (PI weight fraction = 0.16, Mw = 85000, and Mw/Mn = 1.01) was prepared by living anionic polymerization. Spin coated copolymer film on both the hydrophobic Si and hydrophilic oxide and nitride substrates showed a typical layer-by-layer growth mode. The (PS-b-PI) diblock copolymer film became spontaneously ordered after overnight annealing inside a vacuum oven above their glass transition temperature, giving hexagonal-close-packed (hep) phase of PI spheres. The well-controlled monolayer film was selectively etched via ozonation to obtain PI sphere voids and then subsequently reacted with CF4+ ions to etch the PS matrix. We obtained the AFM image of the surface morphology of such formed polymer template, whose pattern consisted of 20-nm-size spheres with a periodicity of 45 nm.

    Original languageEnglish
    Pages (from-to)762-766
    Number of pages5
    JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
    Volume43
    Issue number2
    DOIs
    Publication statusPublished - 2004 Feb

    Keywords

    • Atomic force microscopy
    • Block copolymer
    • Microphase separation
    • Nanotemplate
    • Self-assembly

    ASJC Scopus subject areas

    • General Engineering
    • General Physics and Astronomy

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