Bias-stress stability of top-gate coplanar a-ITGZO TFTs with HfO2 and HfAlO gate dielectrics

Heesung Kong, Kyoungah Cho, Hosang Lee, Seungjun Lee, Junhyung Lim, Sangsig Kim

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

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