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Change in electrical resistance and thermal stability of nitrogen incorporated Ge
2
Sb
2
Te
5
films
YoungKuk Kim
*
, Uk Hwang
, Yong Jai Cho
, H. M. Park
, M. H. Cho
, Pyeong Seok Cho
, Jong Heun Lee
*
Corresponding author for this work
Research output
:
Contribution to journal
›
Article
›
peer-review
36
Citations (Scopus)
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Dive into the research topics of 'Change in electrical resistance and thermal stability of nitrogen incorporated Ge
2
Sb
2
Te
5
films'. Together they form a unique fingerprint.
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Keyphrases
Thermal Stability
100%
Electrical Resistance
100%
Thermoelectric Properties
100%
Ge2Sb2Te5 Film
100%
Resistance Stability
100%
Nitrogen Incorporated
100%
Crystallization Temperature
50%
Grain Boundary
25%
Nitrogen Content
25%
Cubic Structure
25%
Temperature Resistance
25%
X-ray Absorption Spectroscopy
25%
Four-point Probe
25%
FCC Structure
25%
Two-point
25%
Probing Method
25%
Molecular State
25%
Nitrogen States
25%
Phase Transition Process
25%
Excess Nitrogen
25%
Material Science
Thermal Stability
100%
Film
100%
Electrical Resistance
100%
X-Ray Absorption Spectroscopy
25%
Grain Boundaries
25%
Chemical Engineering
Film
100%