Characterization of thin liquid films using molecular dynamics simulation

Jaeil Lee, Seungho Park, Ohmyoung Kwon, Young Ki Choi, Joon Sik Lee

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Various characteristics of a thin liquid film in its vapor-phase are investigated using the molecular dynamics technique. Local distributions of the temperature, density, normal and tangential pressure components, and stress are calculated for various film thicknesses and temperature levels. Distributions of local stresses change considerably with respect to film thicknesses, and interfacial regions on both sides of the film start to overlap with each other as the film becomes thinner. Integration of the local stresses, i.e., the surface tension, however7 does not vary much regardless of the interfacial overlap. The minimum thickness of a liquid film before rupturing is estimated with respect to the calculation domain sizes and is compared with a simple theoretical relation.

Original languageEnglish
Pages (from-to)1477-1484
Number of pages8
JournalKSME International Journal
Volume16
Issue number11
DOIs
Publication statusPublished - 2002 Nov
Externally publishedYes

Bibliographical note

Funding Information:
The authorsg ratefullya cknowledgefi nancial supportfr omthe Micro ThermalS ystemR esearch Center sponsoredb y the Korea Science and EngineeringF oundationa nd S. H. Park has been partially supported from the Basic Research Program of the Korea Science & Engineering Foundationu nder granNto . 1999-1-304-002-5.

Keywords

  • Interfacial Overlap
  • Molecular Dynamics
  • Surface Tension
  • Thin Liquid Film

ASJC Scopus subject areas

  • Mechanical Engineering

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