Circular nanopatterns over large areas from the self-assembly of block copolymers guided by shallow trenches

Sung Woo Hong; Xiaodan Gu; June Huh; Shuaigang Xiao; Thomas P. Russell

doi:10.1021/nn103401w

Circular nanopatterns over large areas from the self-assembly of block copolymers guided by shallow trenches

Sung Woo Hong, Xiaodan Gu, June Huh, Shuaigang Xiao, Thomas P. Russell

Research output: Contribution to journal › Article › peer-review

32 Citations (Scopus)

Abstract

We report the fabrication of ultradense circular nanolines of block copolymer (BCP) microdomains over macroscopic areas. These lines were generated by the directed self-assembly (DSA) of BCPs on the topographically patterned substrates, where the trenches with circular shape are patterned on a flat substrate. The width of the trench and the distance between trenches are varied for commensurability issues, and difference BCPs are used to demonstrate the generality of this strategy. When a commensurability condition is satisfied, BCPs on the topographically patterned substrates undergo a DSA with solvent annealing, resulting in a flat film with an areal density amplification of the circular patterns over large areas. The methodology described here may provide an easy approach to high densities of circularly shaped nanopatterns for data storage device manufacturing.

Original language	English
Pages (from-to)	2855-2860
Number of pages	6
Journal	ACS nano
Volume	5
Issue number	4
DOIs	https://doi.org/10.1021/nn103401w
Publication status	Published - 2011 Apr 26
Externally published	Yes

Keywords

areal density
block copolymer
circular patterns
solvent annealing
trench

ASJC Scopus subject areas

Materials Science(all)
Engineering(all)
Physics and Astronomy(all)

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10.1021/nn103401w

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abstract = "We report the fabrication of ultradense circular nanolines of block copolymer (BCP) microdomains over macroscopic areas. These lines were generated by the directed self-assembly (DSA) of BCPs on the topographically patterned substrates, where the trenches with circular shape are patterned on a flat substrate. The width of the trench and the distance between trenches are varied for commensurability issues, and difference BCPs are used to demonstrate the generality of this strategy. When a commensurability condition is satisfied, BCPs on the topographically patterned substrates undergo a DSA with solvent annealing, resulting in a flat film with an areal density amplification of the circular patterns over large areas. The methodology described here may provide an easy approach to high densities of circularly shaped nanopatterns for data storage device manufacturing.",

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AU - Hong, Sung Woo

AU - Gu, Xiaodan

AU - Huh, June

AU - Xiao, Shuaigang

AU - Russell, Thomas P.

PY - 2011/4/26

Y1 - 2011/4/26

N2 - We report the fabrication of ultradense circular nanolines of block copolymer (BCP) microdomains over macroscopic areas. These lines were generated by the directed self-assembly (DSA) of BCPs on the topographically patterned substrates, where the trenches with circular shape are patterned on a flat substrate. The width of the trench and the distance between trenches are varied for commensurability issues, and difference BCPs are used to demonstrate the generality of this strategy. When a commensurability condition is satisfied, BCPs on the topographically patterned substrates undergo a DSA with solvent annealing, resulting in a flat film with an areal density amplification of the circular patterns over large areas. The methodology described here may provide an easy approach to high densities of circularly shaped nanopatterns for data storage device manufacturing.

AB - We report the fabrication of ultradense circular nanolines of block copolymer (BCP) microdomains over macroscopic areas. These lines were generated by the directed self-assembly (DSA) of BCPs on the topographically patterned substrates, where the trenches with circular shape are patterned on a flat substrate. The width of the trench and the distance between trenches are varied for commensurability issues, and difference BCPs are used to demonstrate the generality of this strategy. When a commensurability condition is satisfied, BCPs on the topographically patterned substrates undergo a DSA with solvent annealing, resulting in a flat film with an areal density amplification of the circular patterns over large areas. The methodology described here may provide an easy approach to high densities of circularly shaped nanopatterns for data storage device manufacturing.

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KW - circular patterns

KW - solvent annealing

KW - trench

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Circular nanopatterns over large areas from the self-assembly of block copolymers guided by shallow trenches

Abstract

Keywords

ASJC Scopus subject areas

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