Comparative investigation of endurance and bias temperature instability characteristics in metal-Al2O3-nitride-oxide-semiconductor (MANOS) and semiconductor-oxide-nitride-oxide-semiconductor (SONOS) charge trap flash memory

Dae Hwan Kim, Sungwook Park, Yujeong Seo, Tae Geun Kim, Dong Myong Kim, Il Hwan Cho

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Engineering

Material Science