Comprehensive Understanding of Fatigue, Breakdown, and Recovery Mechanism by Thickness Scaling in Hf0.5Zr0.5O2/Ge MF(I)S Capacitors for Low Writing Voltages
- Jai Youn Jeong
- , Kyeol Ko
- , Changhwan Shin*
- , Jae Hoon Han*
*Corresponding author for this work
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