Control of refractive index by annealing to achieve high figure of merit for TiO2/Ag/TiO2 multilayer films

Jae Ho Kim; Dae Hyun Kim; Sun Kyung Kim; Dukkyu Bae; Young Zo Yoo; Tae Yeon Seong

doi:10.1016/j.ceramint.2016.06.015

Control of refractive index by annealing to achieve high figure of merit for TiO₂/Ag/TiO₂ multilayer films

Jae Ho Kim
, Dae Hyun Kim
, Sun Kyung Kim
, Dukkyu Bae
, Young Zo Yoo
, Tae Yeon Seong^*

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

33 Citations (Scopus)

Abstract

We modified the refractive index (n) of TiO₂ by annealing at various temperatures to obtain a high figure of merit (FOM) for TiO₂/Ag/TiO₂ (45 nm/17 nm/45 nm) multilayer films deposited on glass substrates. Unlike the as-deposited and 300 °C-annealed TiO₂ films, the 600 °C-annealed sample was crystallized in the anatase phase. The as-deposited TiO₂/Ag/as-deposited TiO₂ multilayer film exhibited a transmittance of 94.6% at 550 nm, whereas that of the as-deposited TiO₂/Ag/600 °C-annealed TiO₂ (lower) multilayer film was 96.6%. At 550 nm, n increased from 2.293 to 2.336 with increasing temperature. The carrier concentration, mobility, and sheet resistance varied with increasing annealing temperature. The samples exhibited smooth surfaces with a root-mean-square roughness of 0.37–1.09 nm. The 600 °C-annealed multilayer yielded the highest Haacke's FOM of 193.9×10⁻³ Ω⁻¹.

Original language	English
Pages (from-to)	14071-14076
Number of pages	6
Journal	Ceramics International
Volume	42
Issue number	12
DOIs	https://doi.org/10.1016/j.ceramint.2016.06.015
Publication status	Published - 2016 Sept 1

Bibliographical note

Funding Information:
This work was supported by the Korea Evaluation Institute of Industrial Technology (KEIT) (Grant no. 10049601 ) and the World Class 300 Project (Grant no. S2317456 ) of the SMBA (Korea). S.-K. K. was supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF), which is funded by the Ministry of Science, ICT, and Future Planning ( NRF-2013R1A1A1059423 ).

Publisher Copyright:
© 2016 Elsevier Ltd and Techna Group S.r.l.

Keywords

Ag
Refractive index
TiO
Transparent conducting electrode

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Ceramics and Composites
Process Chemistry and Technology
Surfaces, Coatings and Films
Materials Chemistry

Access to Document

10.1016/j.ceramint.2016.06.015

Cite this

@article{bbc72f8f370e48598c8e60578c47fcd6,

title = "Control of refractive index by annealing to achieve high figure of merit for TiO2/Ag/TiO2 multilayer films",

abstract = "We modified the refractive index (n) of TiO2 by annealing at various temperatures to obtain a high figure of merit (FOM) for TiO2/Ag/TiO2 (45 nm/17 nm/45 nm) multilayer films deposited on glass substrates. Unlike the as-deposited and 300 °C-annealed TiO2 films, the 600 °C-annealed sample was crystallized in the anatase phase. The as-deposited TiO2/Ag/as-deposited TiO2 multilayer film exhibited a transmittance of 94.6\% at 550 nm, whereas that of the as-deposited TiO2/Ag/600 °C-annealed TiO2 (lower) multilayer film was 96.6\%. At 550 nm, n increased from 2.293 to 2.336 with increasing temperature. The carrier concentration, mobility, and sheet resistance varied with increasing annealing temperature. The samples exhibited smooth surfaces with a root-mean-square roughness of 0.37–1.09 nm. The 600 °C-annealed multilayer yielded the highest Haacke's FOM of 193.9×10−3 Ω−1.",

keywords = "Ag, Refractive index, TiO, Transparent conducting electrode",

author = "Kim, \{Jae Ho\} and Kim, \{Dae Hyun\} and Kim, \{Sun Kyung\} and Dukkyu Bae and Yoo, \{Young Zo\} and Seong, \{Tae Yeon\}",

note = "Funding Information: This work was supported by the Korea Evaluation Institute of Industrial Technology (KEIT) (Grant no. 10049601 ) and the World Class 300 Project (Grant no. S2317456 ) of the SMBA (Korea). S.-K. K. was supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF), which is funded by the Ministry of Science, ICT, and Future Planning ( NRF-2013R1A1A1059423 ). Publisher Copyright: {\textcopyright} 2016 Elsevier Ltd and Techna Group S.r.l.",

year = "2016",

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doi = "10.1016/j.ceramint.2016.06.015",

language = "English",

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T1 - Control of refractive index by annealing to achieve high figure of merit for TiO2/Ag/TiO2 multilayer films

AU - Kim, Jae Ho

AU - Kim, Dae Hyun

AU - Kim, Sun Kyung

AU - Bae, Dukkyu

AU - Yoo, Young Zo

AU - Seong, Tae Yeon

N1 - Funding Information: This work was supported by the Korea Evaluation Institute of Industrial Technology (KEIT) (Grant no. 10049601 ) and the World Class 300 Project (Grant no. S2317456 ) of the SMBA (Korea). S.-K. K. was supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF), which is funded by the Ministry of Science, ICT, and Future Planning ( NRF-2013R1A1A1059423 ). Publisher Copyright: © 2016 Elsevier Ltd and Techna Group S.r.l.

PY - 2016/9/1

Y1 - 2016/9/1

N2 - We modified the refractive index (n) of TiO2 by annealing at various temperatures to obtain a high figure of merit (FOM) for TiO2/Ag/TiO2 (45 nm/17 nm/45 nm) multilayer films deposited on glass substrates. Unlike the as-deposited and 300 °C-annealed TiO2 films, the 600 °C-annealed sample was crystallized in the anatase phase. The as-deposited TiO2/Ag/as-deposited TiO2 multilayer film exhibited a transmittance of 94.6% at 550 nm, whereas that of the as-deposited TiO2/Ag/600 °C-annealed TiO2 (lower) multilayer film was 96.6%. At 550 nm, n increased from 2.293 to 2.336 with increasing temperature. The carrier concentration, mobility, and sheet resistance varied with increasing annealing temperature. The samples exhibited smooth surfaces with a root-mean-square roughness of 0.37–1.09 nm. The 600 °C-annealed multilayer yielded the highest Haacke's FOM of 193.9×10−3 Ω−1.

AB - We modified the refractive index (n) of TiO2 by annealing at various temperatures to obtain a high figure of merit (FOM) for TiO2/Ag/TiO2 (45 nm/17 nm/45 nm) multilayer films deposited on glass substrates. Unlike the as-deposited and 300 °C-annealed TiO2 films, the 600 °C-annealed sample was crystallized in the anatase phase. The as-deposited TiO2/Ag/as-deposited TiO2 multilayer film exhibited a transmittance of 94.6% at 550 nm, whereas that of the as-deposited TiO2/Ag/600 °C-annealed TiO2 (lower) multilayer film was 96.6%. At 550 nm, n increased from 2.293 to 2.336 with increasing temperature. The carrier concentration, mobility, and sheet resistance varied with increasing annealing temperature. The samples exhibited smooth surfaces with a root-mean-square roughness of 0.37–1.09 nm. The 600 °C-annealed multilayer yielded the highest Haacke's FOM of 193.9×10−3 Ω−1.

KW - Ag

KW - Refractive index

KW - TiO

KW - Transparent conducting electrode

UR - https://www.scopus.com/pages/publications/84976448039

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M3 - Article

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SP - 14071

EP - 14076

JO - Ceramics International

JF - Ceramics International

IS - 12

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