Controlled selective growth of ZnO nanorod and microrod arrays on Si substrates by a wet chemical method

Yong Jin Kim, Chul Ho Lee, Young Joon Hong, Gyu Chul Yi, Sung Soo Kim, Hyeonsik Cheong

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127 Citations (Scopus)


The use of a wet chemical method to selectively grow ZnO microrod and nanorod arrays on Si substrates is described. To control the size and position of the ZnO microrods and nanorods, polymethylmethacrylate (PMMA) submicron patterns were prepared on the Si substrates with an intermediate ZnO layer using e-beam lithography. Selective growth of the ZnO structures was achieved by the absence of ZnO nucleation sites on the PMMA mask, resulting in position-controlled growth of ZnO structures only on patterned holes where the ZnO layer was exposed. In addition, the diameters of the ZnO microrods were determined by the patterned hole size, and the diameters as small as 250 nm were obtained when a hole diameter of 250 nm was employed. The structural and optical characteristics of the ZnO microrods were further investigated using x-ray diffraction, transmission electron microscopy, and photoluminescence spectroscopy.

Original languageEnglish
Article number163128
JournalApplied Physics Letters
Issue number16
Publication statusPublished - 2006
Externally publishedYes

Bibliographical note

Funding Information:
This work was financially supported under the National Creative Research Initiative Project by the KOSEF. One of the authors (H.C.) was supported by the KOSEF through the Quantum Photonic Science Research Center.

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)


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