The surface adsorption of fd filamentous phage (fd phage) dispersed in different solution pHs was investigated with functionalized SiO2/Si substrates. The fd phages at high pH (∼9.0) were well-adsorbed on the SiO2/Si surface that was functionalized by 3- aminopropyltriethoxysilane, whereas those at low pH (∼3.0) were well-adsorbed on the cleaned SiO2/Si surface. The high affinity of the carboxylic acid groups (COO-) at high pH (∼9.0) was attributed to the fact that they give a higher adsorption to the positively charged amine groups (NH3+) on the surface of the substrate, similar to the effect of H3O+ at low pH (∼3.0) in a solution on the surface of the hydroxyl groups on the substrate (OH-). Interestingly, the aligned structures of the fd phage at intermediate pH (∼7.0), caused by the locally positively charged coat protein of the fd phage and the shear forces along the washing and blowing direction, were identified. The effective spring constant of the fd phage bundles was estimated to be 0.672 N/m using a force-distance curve. Our results offer prerequisite information for the bottom-up assembly in SiO2/Si substrates using the fd phage in bionanoelectronics.
Bibliographical noteFunding Information:
This work was supported by the National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology (WCU R32-2010-000-10082-0, Converging Research Center Program, 2010K000981 and No. 2005-2002369) and by Korea Institute of Science and Technology-Europe basic research program.
ASJC Scopus subject areas
- General Physics and Astronomy