Corrigendum to “Post dry etching treatment of nanopillar GaN/InGaN multi-quantum-wells” [J. Alloy. Compd. 868 (2021) 159211] (Journal of Alloys and Compounds (2021) 868, (S0925838821006198), (10.1016/j.jallcom.2021.159211))

A. Y. Polyakov; L. A. Alexanyan; M. L. Skorikov; A. V. Chernykh; I. V. Shchemerov; V. N. Murashev; Tae Hwan Kim; In Hwan Lee; S. J. Pearton

doi:10.1016/j.jallcom.2021.161947

Corrigendum to “Post dry etching treatment of nanopillar GaN/InGaN multi-quantum-wells” [J. Alloy. Compd. 868 (2021) 159211] (Journal of Alloys and Compounds (2021) 868, (S0925838821006198), (10.1016/j.jallcom.2021.159211))

A. Y. Polyakov, L. A. Alexanyan, M. L. Skorikov, A. V. Chernykh, I. V. Shchemerov, V. N. Murashev, Tae Hwan Kim, In Hwan Lee, S. J. Pearton

Department of Materials Science and Engineering

Research output: Contribution to journal › Comment/debate › peer-review

Abstract

The authors regret author In-Hwan Lee's affiliation was incorrectly shown in the original version. The authors would like to apologise for any inconvenience caused. https://doi.org/10.1016/j.jallcom.2021.159211.

Original language	English
Article number	161947
Journal	Journal of Alloys and Compounds
Volume	888
DOIs	https://doi.org/10.1016/j.jallcom.2021.161947
Publication status	Published - 2021 Dec 25

Bibliographical note

Publisher Copyright:
© 2021 Elsevier B.V.

ASJC Scopus subject areas

Mechanics of Materials
Mechanical Engineering
Metals and Alloys
Materials Chemistry

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Polyakov, A. Y., Alexanyan, L. A., Skorikov, M. L., Chernykh, A. V., Shchemerov, I. V., Murashev, V. N., Kim, T. H., Lee, I. H., & Pearton, S. J. (2021). Corrigendum to “Post dry etching treatment of nanopillar GaN/InGaN multi-quantum-wells” [J. Alloy. Compd. 868 (2021) 159211] (Journal of Alloys and Compounds (2021) 868, (S0925838821006198), (10.1016/j.jallcom.2021.159211)). Journal of Alloys and Compounds, 888, Article 161947. https://doi.org/10.1016/j.jallcom.2021.161947

Corrigendum to “Post dry etching treatment of nanopillar GaN/InGaN multi-quantum-wells” [J. Alloy. Compd. 868 (2021) 159211] (Journal of Alloys and Compounds (2021) 868, (S0925838821006198), (10.1016/j.jallcom.2021.159211)). / Polyakov, A. Y.; Alexanyan, L. A.; Skorikov, M. L. et al.
In: Journal of Alloys and Compounds, Vol. 888, 161947, 25.12.2021.

Research output: Contribution to journal › Comment/debate › peer-review

Polyakov, AY, Alexanyan, LA, Skorikov, ML, Chernykh, AV, Shchemerov, IV, Murashev, VN, Kim, TH, Lee, IH & Pearton, SJ 2021, 'Corrigendum to “Post dry etching treatment of nanopillar GaN/InGaN multi-quantum-wells” [J. Alloy. Compd. 868 (2021) 159211] (Journal of Alloys and Compounds (2021) 868, (S0925838821006198), (10.1016/j.jallcom.2021.159211))', Journal of Alloys and Compounds, vol. 888, 161947. https://doi.org/10.1016/j.jallcom.2021.161947

Polyakov AY, Alexanyan LA, Skorikov ML, Chernykh AV, Shchemerov IV, Murashev VN et al. Corrigendum to “Post dry etching treatment of nanopillar GaN/InGaN multi-quantum-wells” [J. Alloy. Compd. 868 (2021) 159211] (Journal of Alloys and Compounds (2021) 868, (S0925838821006198), (10.1016/j.jallcom.2021.159211)). Journal of Alloys and Compounds. 2021 Dec 25;888:161947. doi: 10.1016/j.jallcom.2021.161947

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title = "Corrigendum to “Post dry etching treatment of nanopillar GaN/InGaN multi-quantum-wells” [J. Alloy. Compd. 868 (2021) 159211] (Journal of Alloys and Compounds (2021) 868, (S0925838821006198), (10.1016/j.jallcom.2021.159211))",

abstract = "The authors regret author In-Hwan Lee's affiliation was incorrectly shown in the original version. The authors would like to apologise for any inconvenience caused. https://doi.org/10.1016/j.jallcom.2021.159211.",

author = "Polyakov, {A. Y.} and Alexanyan, {L. A.} and Skorikov, {M. L.} and Chernykh, {A. V.} and Shchemerov, {I. V.} and Murashev, {V. N.} and Kim, {Tae Hwan} and Lee, {In Hwan} and Pearton, {S. J.}",

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AU - Alexanyan, L. A.

AU - Skorikov, M. L.

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Corrigendum to “Post dry etching treatment of nanopillar GaN/InGaN multi-quantum-wells” [J. Alloy. Compd. 868 (2021) 159211] (Journal of Alloys and Compounds (2021) 868, (S0925838821006198), (10.1016/j.jallcom.2021.159211))

Abstract

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