Damage and residual layer analysis of reactive ion etching textured multi-crystalline silicon wafer for application to solar cells

Engineering & Materials Science

• Amorphous silicon 20%
• Byproducts 30%
• Catalysts 25%
• Conversion efficiency 15%
• Crystalline materials 77%
• Current density 14%
• Electron spectroscopy 25%
• Etching 79%
• Lasers 11%
• Metals 18%
• Plasmas 27%
• Reactive ion etching 100%
• Short circuit currents 14%
• Silicon 11%
• Silicon oxides 21%
• Silicon solar cells 40%
• Silicon wafers 89%
• Solar cells 78%
• Texturing 18%
• X ray photoelectron spectroscopy 18%
• X-Ray Emission Spectrometry 19%

Chemical Compounds

• Acidic Solution 7%
• Amorphous Silicon 10%
• Application 23%
• Byproduct 14%
• Current Density 5%
• Electron Transmission Spectroscopy 10%
• Energy Dispersive X-Ray Spectroscopy 6%
• Etching 66%
• Ion 29%
• Short Circuit 7%
• Silicon Oxide 9%
• Solar Cell 63%
• Surface 4%
• Surface Damage 11%
• X-Ray Photoelectron Spectroscopy 5%