Dependence of photoluminescence of Bi-doped Y2O3 phosphor thin films on oxygen content in the sputtering atmosphere

Hee Bum Lee; Seong Il Kim; Jong Heun Lee; Young Hwan Kim

doi:10.1016/j.tsf.2018.01.059

Dependence of photoluminescence of Bi-doped Y₂O₃ phosphor thin films on oxygen content in the sputtering atmosphere

Hee Bum Lee, Seong Il Kim, Jong Heun Lee, Young Hwan Kim

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

Photoluminescence (PL) emission properties of Bi-doped Y₂O₃ (Bi:Y₂O₃) phosphor thin films were investigated depending on the oxygen content in the sputtering atmosphere to find out the optimal oxygen content for obtaining Bi:Y₂O₃ phosphor thin film with strong PL emission intensity. PL emission intensity was greatly increased by adding a small amount of oxygen to the sputtering atmosphere. However, it was gradually decreased with further increasing the oxygen content. This behavior is thought to be due to the variation of crystallinity and surface roughness of the film depending on the oxygen content in the sputtering atmosphere. The film crystallinity showed similar behavior to PL emission intensity and the surface roughness except the case of Ar only was also decreased gradually with increasing the oxygen content. Density of point defects such as oxygen vacancy and interstitial in the film was expected to be changed according to the oxygen content in the sputtering atmosphere and also this change was considered to have an effect on the PL emission intensity of the Bi:Y₂O₃ film. In this work, Bi:Y₂O₃ phosphor thin film with the strongest PL emission intensity could be fabricated with the oxygen content of 10% in the sputtering atmosphere.

Original language	English
Pages (from-to)	1-6
Number of pages	6
Journal	Thin Solid Films
Volume	650
DOIs	https://doi.org/10.1016/j.tsf.2018.01.059
Publication status	Published - 2018 Mar 31

Keywords

Bismuth-doped yttrium trioxide
Crystallinity
Oxygen feed gas
Phosphors
Photoluminescence
Sputtering
Surface roughness
Thin films

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2018.01.059

Cite this

@article{03b4f5fe5f174c649ea4dd7afb7810a9,

title = "Dependence of photoluminescence of Bi-doped Y2O3 phosphor thin films on oxygen content in the sputtering atmosphere",

abstract = "Photoluminescence (PL) emission properties of Bi-doped Y2O3 (Bi:Y2O3) phosphor thin films were investigated depending on the oxygen content in the sputtering atmosphere to find out the optimal oxygen content for obtaining Bi:Y2O3 phosphor thin film with strong PL emission intensity. PL emission intensity was greatly increased by adding a small amount of oxygen to the sputtering atmosphere. However, it was gradually decreased with further increasing the oxygen content. This behavior is thought to be due to the variation of crystallinity and surface roughness of the film depending on the oxygen content in the sputtering atmosphere. The film crystallinity showed similar behavior to PL emission intensity and the surface roughness except the case of Ar only was also decreased gradually with increasing the oxygen content. Density of point defects such as oxygen vacancy and interstitial in the film was expected to be changed according to the oxygen content in the sputtering atmosphere and also this change was considered to have an effect on the PL emission intensity of the Bi:Y2O3 film. In this work, Bi:Y2O3 phosphor thin film with the strongest PL emission intensity could be fabricated with the oxygen content of 10% in the sputtering atmosphere.",

keywords = "Bismuth-doped yttrium trioxide, Crystallinity, Oxygen feed gas, Phosphors, Photoluminescence, Sputtering, Surface roughness, Thin films",

author = "Lee, {Hee Bum} and Kim, {Seong Il} and Lee, {Jong Heun} and Kim, {Young Hwan}",

note = "Funding Information: This work was supported by the Korea Institute of Science and Technology (Grant No. 2E26970 ). Publisher Copyright: {\textcopyright} 2018 Elsevier B.V.",

year = "2018",

month = mar,

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doi = "10.1016/j.tsf.2018.01.059",

language = "English",

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journal = "Thin Solid Films",

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AU - Lee, Hee Bum

AU - Kim, Seong Il

AU - Lee, Jong Heun

AU - Kim, Young Hwan

PY - 2018/3/31

Y1 - 2018/3/31

N2 - Photoluminescence (PL) emission properties of Bi-doped Y2O3 (Bi:Y2O3) phosphor thin films were investigated depending on the oxygen content in the sputtering atmosphere to find out the optimal oxygen content for obtaining Bi:Y2O3 phosphor thin film with strong PL emission intensity. PL emission intensity was greatly increased by adding a small amount of oxygen to the sputtering atmosphere. However, it was gradually decreased with further increasing the oxygen content. This behavior is thought to be due to the variation of crystallinity and surface roughness of the film depending on the oxygen content in the sputtering atmosphere. The film crystallinity showed similar behavior to PL emission intensity and the surface roughness except the case of Ar only was also decreased gradually with increasing the oxygen content. Density of point defects such as oxygen vacancy and interstitial in the film was expected to be changed according to the oxygen content in the sputtering atmosphere and also this change was considered to have an effect on the PL emission intensity of the Bi:Y2O3 film. In this work, Bi:Y2O3 phosphor thin film with the strongest PL emission intensity could be fabricated with the oxygen content of 10% in the sputtering atmosphere.

AB - Photoluminescence (PL) emission properties of Bi-doped Y2O3 (Bi:Y2O3) phosphor thin films were investigated depending on the oxygen content in the sputtering atmosphere to find out the optimal oxygen content for obtaining Bi:Y2O3 phosphor thin film with strong PL emission intensity. PL emission intensity was greatly increased by adding a small amount of oxygen to the sputtering atmosphere. However, it was gradually decreased with further increasing the oxygen content. This behavior is thought to be due to the variation of crystallinity and surface roughness of the film depending on the oxygen content in the sputtering atmosphere. The film crystallinity showed similar behavior to PL emission intensity and the surface roughness except the case of Ar only was also decreased gradually with increasing the oxygen content. Density of point defects such as oxygen vacancy and interstitial in the film was expected to be changed according to the oxygen content in the sputtering atmosphere and also this change was considered to have an effect on the PL emission intensity of the Bi:Y2O3 film. In this work, Bi:Y2O3 phosphor thin film with the strongest PL emission intensity could be fabricated with the oxygen content of 10% in the sputtering atmosphere.

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