TY - JOUR
T1 - Deposition of TiN films on Co-Cr for improving mechanical properties and biocompatibility using reactive DC sputtering
AU - Pham, Vuong Hung
AU - Yook, Se Won
AU - Lee, Eun Jung
AU - Li, Yuanlong
AU - Jeon, Gyuran
AU - Lee, Jung Joong
AU - Kim, Hyoun Ee
AU - Koh, Young Hag
N1 - Funding Information:
Acknowledgments This research was supported by WCU (World Class University) project through National Research Foundation of Korea funded by the Ministry of Education, Science and Technology (R31-2008-000-10075-0) and by the Fundamental R&D Program for Core Technology of Materials funded by the Ministry of Knowledge Economy, Republic of Korea.
PY - 2011/10
Y1 - 2011/10
N2 - This study reports the deposition of TiN films on Co-Cr substrates to improve the substrates' mechanical properties and biological properties. In particular, the argon to nitrogen (Ar:N 2) gas flow ratio was adjusted to control the microstructure of the TiN films. A Ti interlayer was also used to enhance the adhesion strength between the Co-Cr substrate and TiN films. A series of TiN films, which are denoted as TiN-(Ar/N 2)1:1, Ti/TiN-(Ar/N 2)1:1, and Ti/TiN-(Ar:N 2)1:3, were deposited by reactive DC sputtering. All the deposited TiN films showed a dense, columnar structure with a preferential orientation of the (200) plane. These TiN films increased the mechanical properties of Co-Cr, such as the critical load during scratch testing, hardness, elastic modulus and plastic resistance. In addition, the biological properties of the Co-Cr substrates, i.e. initial attachment, proliferation, and cellular differentiation of the MC3T3-E1 cells, were improved considerably by deposition of the TiN films. These results suggest that TiN films would effectively enhance both the mechanical properties and biocompatibility of biomedical Co-Cr alloys.
AB - This study reports the deposition of TiN films on Co-Cr substrates to improve the substrates' mechanical properties and biological properties. In particular, the argon to nitrogen (Ar:N 2) gas flow ratio was adjusted to control the microstructure of the TiN films. A Ti interlayer was also used to enhance the adhesion strength between the Co-Cr substrate and TiN films. A series of TiN films, which are denoted as TiN-(Ar/N 2)1:1, Ti/TiN-(Ar/N 2)1:1, and Ti/TiN-(Ar:N 2)1:3, were deposited by reactive DC sputtering. All the deposited TiN films showed a dense, columnar structure with a preferential orientation of the (200) plane. These TiN films increased the mechanical properties of Co-Cr, such as the critical load during scratch testing, hardness, elastic modulus and plastic resistance. In addition, the biological properties of the Co-Cr substrates, i.e. initial attachment, proliferation, and cellular differentiation of the MC3T3-E1 cells, were improved considerably by deposition of the TiN films. These results suggest that TiN films would effectively enhance both the mechanical properties and biocompatibility of biomedical Co-Cr alloys.
UR - http://www.scopus.com/inward/record.url?scp=84855204385&partnerID=8YFLogxK
U2 - 10.1007/s10856-011-4410-8
DO - 10.1007/s10856-011-4410-8
M3 - Article
C2 - 21837553
AN - SCOPUS:84855204385
SN - 0957-4522
VL - 22
SP - 2231
EP - 2237
JO - Journal of Materials Science: Materials in Electronics
JF - Journal of Materials Science: Materials in Electronics
IS - 10
ER -