Deterministic nanotexturing by directional photofluidization lithography

Seungwoo Lee, Jonghwa Shin, Hong Suk Kang, Yong Hee Lee, Jung Ki Park

Research output: Contribution to journalArticlepeer-review

35 Citations (Scopus)

Abstract

Directional photofluidization lithography enables deterministic large-area nanotexturing of periodic surface reliefs with precisely controlled structural complexity. The proposed nanotexturing technique demonstrates a hidden potential of micro- and nanofabrication methods, which allows for manipulation of the photonic and interface properties of nanotextured surfaces.

Original languageEnglish
Pages (from-to)3244-3250
Number of pages7
JournalAdvanced Materials
Volume23
Issue number29
DOIs
Publication statusPublished - 2011 Aug 2

Keywords

  • azopolymer
  • complex periodic nanotextures
  • directional photofluidization
  • nanohexagons

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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