Deterministic nanotexturing by directional photofluidization lithography

Seungwoo Lee; Jonghwa Shin; Hong Suk Kang; Yong Hee Lee; Jung Ki Park

doi:10.1002/adma.201100662

Deterministic nanotexturing by directional photofluidization lithography

Seungwoo Lee, Jonghwa Shin, Hong Suk Kang, Yong Hee Lee, Jung Ki Park

KU-KIST Graduate School of Converging Science and Technology

Research output: Contribution to journal › Article › peer-review

35 Citations (Scopus)

Abstract

Directional photofluidization lithography enables deterministic large-area nanotexturing of periodic surface reliefs with precisely controlled structural complexity. The proposed nanotexturing technique demonstrates a hidden potential of micro- and nanofabrication methods, which allows for manipulation of the photonic and interface properties of nanotextured surfaces.

Original language	English
Pages (from-to)	3244-3250
Number of pages	7
Journal	Advanced Materials
Volume	23
Issue number	29
DOIs	https://doi.org/10.1002/adma.201100662
Publication status	Published - 2011 Aug 2

Keywords

azopolymer
complex periodic nanotextures
directional photofluidization
nanohexagons

ASJC Scopus subject areas

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

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10.1002/adma.201100662

Cite this

@article{52629c21b7044914b46fa9b08e403079,

title = "Deterministic nanotexturing by directional photofluidization lithography",

abstract = "Directional photofluidization lithography enables deterministic large-area nanotexturing of periodic surface reliefs with precisely controlled structural complexity. The proposed nanotexturing technique demonstrates a hidden potential of micro- and nanofabrication methods, which allows for manipulation of the photonic and interface properties of nanotextured surfaces.",

keywords = "azopolymer, complex periodic nanotextures, directional photofluidization, nanohexagons",

author = "Seungwoo Lee and Jonghwa Shin and Kang, {Hong Suk} and Lee, {Yong Hee} and Park, {Jung Ki}",

year = "2011",

month = aug,

day = "2",

doi = "10.1002/adma.201100662",

language = "English",

volume = "23",

pages = "3244--3250",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-VCH Verlag",

number = "29",

}

TY - JOUR

T1 - Deterministic nanotexturing by directional photofluidization lithography

AU - Lee, Seungwoo

AU - Shin, Jonghwa

AU - Kang, Hong Suk

AU - Lee, Yong Hee

AU - Park, Jung Ki

PY - 2011/8/2

Y1 - 2011/8/2

N2 - Directional photofluidization lithography enables deterministic large-area nanotexturing of periodic surface reliefs with precisely controlled structural complexity. The proposed nanotexturing technique demonstrates a hidden potential of micro- and nanofabrication methods, which allows for manipulation of the photonic and interface properties of nanotextured surfaces.

AB - Directional photofluidization lithography enables deterministic large-area nanotexturing of periodic surface reliefs with precisely controlled structural complexity. The proposed nanotexturing technique demonstrates a hidden potential of micro- and nanofabrication methods, which allows for manipulation of the photonic and interface properties of nanotextured surfaces.

KW - azopolymer

KW - complex periodic nanotextures

KW - directional photofluidization

KW - nanohexagons

UR - http://www.scopus.com/inward/record.url?scp=79960898047&partnerID=8YFLogxK

U2 - 10.1002/adma.201100662

DO - 10.1002/adma.201100662

M3 - Article

C2 - 21638346

AN - SCOPUS:79960898047

SN - 0935-9648

VL - 23

SP - 3244

EP - 3250

JO - Advanced Materials

JF - Advanced Materials

IS - 29

ER -

Deterministic nanotexturing by directional photofluidization lithography

Abstract

Keywords

ASJC Scopus subject areas

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