Abstract
In this letter, we propose a gallium oxide/oxygen doped silicon nitride-based resistive switching device for removing sneak-path currents in high-density crossbar array structures. The device exhibited diodelike characteristics owing to a simple Schottky contact and ultralow power operating behavior (∼ 0.5 V, 1 μA) without any forming process. Both ON/OFF and rectification ratios exceeded 103, and the fastest ac-pulse program (erase) time was 50 (80) ns. The ac-pulse program and erase tests showed 105 cycle endurance without degradation, and dc test showed over 102 cycle endurance. Furthermore, data retention time was > 105 s at room temperature.
| Original language | English |
|---|---|
| Article number | 7210154 |
| Pages (from-to) | 1024-1026 |
| Number of pages | 3 |
| Journal | IEEE Electron Device Letters |
| Volume | 36 |
| Issue number | 10 |
| DOIs | |
| Publication status | Published - 2015 Oct |
Bibliographical note
Funding Information:This work was supported in part by the National Research Foundation of Korea through the Korean Government within the Ministry of Education, Science and Technology under Grant 2011-0028769, and in part by the Samsung Semiconductor Research Center, Korea University. The review of this letter was arranged by Editor D. Ha.
Publisher Copyright:
© 2015 IEEE.
Keywords
- Bilayer
- diodelike
- gallium oxide
- resistive random access memory
- silicon nitride
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering
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