Dispersion of nanodiamond on chemical mechanical polishing performance for Ge₁Sb₆Te₃ film

Keyphrases

• Nanodiamond 100%
• Surfactant Concentration 100%
• Polishing Performance 100%
• Chemical Mechanical Polishing 100%
• Surface Roughness 50%
• Slurry 50%
• Polystyrene Sulfonate 50%
• Nanodiamond Particles 50%
• Material Removal Rate 50%
• Surface Material 50%
• Milling Process 33%
• Polishing Process 33%
• Particle Size 16%
• Zeta Potential 16%
• Electrostatic Repulsion 16%
• Surfactant Effect 16%
• Passivation Layer 16%
• Transmission Electron Microscopy Images 16%
• Milling System 16%
• Average Particle Size 16%
• Dispersion Agent 16%
• Particle Transmission 16%
• Diamond Nanoparticles 16%

Material Science

• Film 100%
• Chemical Mechanical Planarization 100%
• Surface Active Agent 100%
• Surface Roughness 50%
• Sodium 50%
• Transmission Electron Microscopy 16%
• Nanoparticle 16%
• Diamond 16%