Double Laser Crystallization (DLC) of pre-patterned amorphous silicon film and amorphous silicon film with a patterned assisting SIO2 layer

Li Xu; Jaewon Chung; Costas P. Grigoropoulos

doi:10.1115/ht-fed2004-56729

Double Laser Crystallization (DLC) of pre-patterned amorphous silicon film and amorphous silicon film with a patterned assisting SIO₂ layer

Li Xu, Jaewon Chung, Costas P. Grigoropoulos

Research output: Contribution to conference › Paper › peer-review

1 Citation (Scopus)

Abstract

In this study, pre-patterned amorphous silicon films are crystallized by the double laser crystallization (DLC) technique. Temperature distribution upon laser irradiation is modified by patterning the a-Si film, thus controlling the crystal growth. Patterns with a flattened concave feature is found to be favorable for large crystal growth with high localization, yielding grains with the size of 1.5 μm × 4 μm. As an alternate method (to pre-patterning the amorphous silicon film) for obtaining large crystal growth, double laser crystallization of amorphous silicon film with patterned SiO₂ cap layer is proposed. The SiO₂ layer assists the lateral growth of the crystals by acting as a thermal reservoir and slowing down the cooling rate, and additionally helps reduce the roughness of the polycrystalline surface to about 3nm (R.M.S.). With this alternate method, the grain width is increased from 0.5 μm to 1.5μm.

Original language	English
Pages	627-630
Number of pages	4
DOIs	https://doi.org/10.1115/ht-fed2004-56729
Publication status	Published - 2004
Externally published	Yes
Event	Proceedings of the ASME Heat Transfer/Fluids Engineering Summer Conference 2004, HT/FED 2004 - Charlotte, NC, United States Duration: 2004 Jul 11 → 2004 Jul 15

Other

Other	Proceedings of the ASME Heat Transfer/Fluids Engineering Summer Conference 2004, HT/FED 2004
Country/Territory	United States
City	Charlotte, NC
Period	04/7/11 → 04/7/15

Keywords

Double laser crystallization
Thin film transistors

ASJC Scopus subject areas

General Engineering

Access to Document

10.1115/ht-fed2004-56729

Cite this

Xu, L., Chung, J., & Grigoropoulos, C. P. (2004). Double Laser Crystallization (DLC) of pre-patterned amorphous silicon film and amorphous silicon film with a patterned assisting SIO₂ layer. 627-630. Paper presented at Proceedings of the ASME Heat Transfer/Fluids Engineering Summer Conference 2004, HT/FED 2004, Charlotte, NC, United States. https://doi.org/10.1115/ht-fed2004-56729

Double Laser Crystallization (DLC) of pre-patterned amorphous silicon film and amorphous silicon film with a patterned assisting SIO₂ layer. / Xu, Li; Chung, Jaewon; Grigoropoulos, Costas P.
2004. 627-630 Paper presented at Proceedings of the ASME Heat Transfer/Fluids Engineering Summer Conference 2004, HT/FED 2004, Charlotte, NC, United States.

Research output: Contribution to conference › Paper › peer-review

Xu, L, Chung, J & Grigoropoulos, CP 2004, 'Double Laser Crystallization (DLC) of pre-patterned amorphous silicon film and amorphous silicon film with a patterned assisting SIO₂ layer', Paper presented at Proceedings of the ASME Heat Transfer/Fluids Engineering Summer Conference 2004, HT/FED 2004, Charlotte, NC, United States, 04/7/11 - 04/7/15 pp. 627-630. https://doi.org/10.1115/ht-fed2004-56729

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