Driving characteristics of the electrowetting-on-dielectric device using atomic-layer-deposited aluminum oxide as the dielectric

Jong Hyeon Chang, Dae Young Choi, Seungoh Han, James Jungho Pak

Research output: Contribution to journalArticlepeer-review

74 Citations (Scopus)


Electrowetting on dielectric (EWOD) is useful in manipulating droplets for digital (droplet-based) microfluidics, but its high driving voltage over several tens of volts has been a barrier to overcome. This article presents the characteristics of EWOD device with aluminum oxide (Al2O3, ε r ≈ 10) deposited by atomic layer deposition (ALD), for the first time as the high-k dielectric for lowering the EWOD driving voltage substantially. The EWOD device of the single-plate configuration was fabricated by several steps for the control electrode array of 1 mm × 1 mm squares with 50 μm space, the dielectric layer of 1,270 Å thick ALD Al 2O3, the reference electrode of 20 μm wide line electrode, and the hydrophobic surface treatment by Teflon-AF coating, respectively. We observed the movement of a 2 μl water droplet in an air environment, applying a voltage between one of the control electrodes and the reference electrode in contact with the droplet. The droplet velocity exponentially depending on the applied voltage below 15 V was obtained. The measured threshold voltage to move the droplet was as low as 3 V which is the lowest voltage reported so far in the EWOD researches. This result opens a possibility of manipulating droplets, without any surfactant or oil treatment, at only a few volts by EWOD using ALD Al2O3 as the dielectric.

Original languageEnglish
Pages (from-to)269-273
Number of pages5
JournalMicrofluidics and Nanofluidics
Issue number2
Publication statusPublished - 2010 Feb

Bibliographical note

Funding Information:
Acknowledgments The authors thank NCD Technology in Korea for Al2O3 ALD service. This work was supported by the National Research Foundation of Korea (NRF) through a grant provided by Ministry of Education, Science and Technology (MEST) in 2009 (No. K20601000002–09E0100–00200) and also supported by a Korea University Grant.


  • Aluminum oxide (AlO)
  • Atomic layer deposition (ALD)
  • Digital microfluidics
  • Electrowetting on dielectric (EWOD)
  • Single-plate configuration

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Materials Chemistry


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