Duty ratio-controlled reflective property of silicon nitride films deposited at room temperature using a pulsed-PECVD at SiH4-NH 3 plasma

Daehyun Kim, Sujin Lee, Byungwhan Kim, Byung Jun Kang, Donghwan Kim

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds

Physics & Astronomy