Dynamic Change in Color Filter Layers during the Baking Process by Multi-Speckle Diffusing Wave Spectroscopy

Baek Sung Park; Kyung Hee Hyung; Gwi Jeong Oh; Hyun Wook Jung

doi:10.1002/ceat.201700147

Dynamic Change in Color Filter Layers during the Baking Process by Multi-Speckle Diffusing Wave Spectroscopy

Baek Sung Park, Kyung Hee Hyung, Gwi Jeong Oh, Hyun Wook Jung

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

Undercut defects of color filter (CF) layers, which inevitably occur in UV curing and development processes for liquid crystal displays and white organic light-emitting diodes, should be elucidated to ensure product quality and processability. The dynamic changes of the green CF layer are investigated during the baking process by examining the motion of pigment particles within the thin CF layer via multi-speckle diffusing wave spectroscopy (MSDWS). Autocorrelation functions and characteristic times for the α-relaxation, which are determined using light intensities scattered from the CF layer, directly indicate thermal melting and curing stages in the process. It is confirmed that MSDWS is a reliable non-contact measurement tool for quantitatively analyzing the initial change of the CF layer during the baking process.

Original language	English
Pages (from-to)	2230-2238
Number of pages	9
Journal	Chemical Engineering and Technology
Volume	40
Issue number	12
DOIs	https://doi.org/10.1002/ceat.201700147
Publication status	Published - 2017 Dec

Bibliographical note

Funding Information:
This work was supported by the National Research Foundation of Korea (NRF) grant-funded by the Korea government (MSIP) (NRF-2016R1A5A1009592) and the Ministry of Trade, Industry & Energy (MOTIE, Korea) under the Industrial Technology Innovation Program (No. 10067706).

Publisher Copyright:
© 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

Keywords

Autocorrelation function
Characteristic relaxation time
Color filter
Multi-speckle diffusing wave spectroscopy
Particle dynamics

ASJC Scopus subject areas

General Chemistry
General Chemical Engineering
Industrial and Manufacturing Engineering

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10.1002/ceat.201700147

Cite this

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title = "Dynamic Change in Color Filter Layers during the Baking Process by Multi-Speckle Diffusing Wave Spectroscopy",

abstract = "Undercut defects of color filter (CF) layers, which inevitably occur in UV curing and development processes for liquid crystal displays and white organic light-emitting diodes, should be elucidated to ensure product quality and processability. The dynamic changes of the green CF layer are investigated during the baking process by examining the motion of pigment particles within the thin CF layer via multi-speckle diffusing wave spectroscopy (MSDWS). Autocorrelation functions and characteristic times for the α-relaxation, which are determined using light intensities scattered from the CF layer, directly indicate thermal melting and curing stages in the process. It is confirmed that MSDWS is a reliable non-contact measurement tool for quantitatively analyzing the initial change of the CF layer during the baking process.",

keywords = "Autocorrelation function, Characteristic relaxation time, Color filter, Multi-speckle diffusing wave spectroscopy, Particle dynamics",

author = "Park, {Baek Sung} and Hyung, {Kyung Hee} and Oh, {Gwi Jeong} and Jung, {Hyun Wook}",

note = "Funding Information: This work was supported by the National Research Foundation of Korea (NRF) grant-funded by the Korea government (MSIP) (NRF-2016R1A5A1009592) and the Ministry of Trade, Industry & Energy (MOTIE, Korea) under the Industrial Technology Innovation Program (No. 10067706). Publisher Copyright: {\textcopyright} 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim",

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AU - Park, Baek Sung

AU - Hyung, Kyung Hee

AU - Oh, Gwi Jeong

AU - Jung, Hyun Wook

N1 - Funding Information: This work was supported by the National Research Foundation of Korea (NRF) grant-funded by the Korea government (MSIP) (NRF-2016R1A5A1009592) and the Ministry of Trade, Industry & Energy (MOTIE, Korea) under the Industrial Technology Innovation Program (No. 10067706). Publisher Copyright: © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

PY - 2017/12

Y1 - 2017/12

N2 - Undercut defects of color filter (CF) layers, which inevitably occur in UV curing and development processes for liquid crystal displays and white organic light-emitting diodes, should be elucidated to ensure product quality and processability. The dynamic changes of the green CF layer are investigated during the baking process by examining the motion of pigment particles within the thin CF layer via multi-speckle diffusing wave spectroscopy (MSDWS). Autocorrelation functions and characteristic times for the α-relaxation, which are determined using light intensities scattered from the CF layer, directly indicate thermal melting and curing stages in the process. It is confirmed that MSDWS is a reliable non-contact measurement tool for quantitatively analyzing the initial change of the CF layer during the baking process.

AB - Undercut defects of color filter (CF) layers, which inevitably occur in UV curing and development processes for liquid crystal displays and white organic light-emitting diodes, should be elucidated to ensure product quality and processability. The dynamic changes of the green CF layer are investigated during the baking process by examining the motion of pigment particles within the thin CF layer via multi-speckle diffusing wave spectroscopy (MSDWS). Autocorrelation functions and characteristic times for the α-relaxation, which are determined using light intensities scattered from the CF layer, directly indicate thermal melting and curing stages in the process. It is confirmed that MSDWS is a reliable non-contact measurement tool for quantitatively analyzing the initial change of the CF layer during the baking process.

KW - Autocorrelation function

KW - Characteristic relaxation time

KW - Color filter

KW - Multi-speckle diffusing wave spectroscopy

KW - Particle dynamics

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Dynamic Change in Color Filter Layers during the Baking Process by Multi-Speckle Diffusing Wave Spectroscopy

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Bibliographical note

Keywords

ASJC Scopus subject areas

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