Effect of buffer layer on the growth of GaN on Si substrate

Jeong Wook Lee, Sung Hoon Jung, Hui Youn Shin, In Hwan Lee, Cheol Woong Yang, Sang Hak Lee, Ji Beom Yoo

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)


For the epitaxial growth of GaN on Si substrate the buffer layer is essential as an anchor to achieve nucleation and duplicate orientation. In this study, AlN layer was used as a buffer layer for the growth of GaN on Si substrate and the effect of crystal quality of an AlN buffer layer on the growth characteristics of GaN was investigated. To compare the effect of various AlN buffer layers on the GaN growth we prepared three types of AlN using MOCVD, MOMBE and RF-sputtering, respectively. Then the epitaxial growth of GaN by MOCVD using high quality AlN buffer layer was identified. The AlN epitaxial layer has reduced the misorientation of both in-plane and out-plane between GaN and AlN layer at the initial growth stage. It implies that GaN can be epitaxially grown in case of using epitaxially grown AlN buffer layer irrespective of growth method.

Original languageEnglish
Pages (from-to)1094-1098
Number of pages5
JournalJournal of Crystal Growth
Issue number1 4 II
Publication statusPublished - 2002 Apr
Externally publishedYes


  • A1. X-ray diffraction
  • A3. Metalorganic chemical vapor deposition
  • B1. Gallium compounds
  • B1. Nitrides
  • B2. Semiconducting aluminum compounds
  • B2. Semiconducting gallium
  • B3. Scanning electron microscopy
  • B3. Transmission electron microscopy

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry


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