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Effect of deposition pressure on the electrical properties of nitrogen-doped amorphous carbon films
Hyungon Oh
, Kyoungah Cho
*
,
Sangsig Kim
*
Corresponding author for this work
Research output
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Contribution to journal
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Article
›
peer-review
3
Citations (Scopus)
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Keyphrases
Amorphous Carbon Film
100%
Carrier Concentration
66%
Carrier Mobility
33%
Cm(III)
33%
DC Magnetron Sputtering
33%
Deposition Pressure
100%
Deposition Rate
33%
Electrical Properties
100%
Low Pressure
33%
Magnetron Sputtering Deposition
33%
Nitrogen-doped Amorphous Carbon
100%
Raman Spectroscopy
33%
Rate of Increase
33%
Resistivity
66%
X-ray Photoelectron Spectroscopy
33%
Material Science
Amorphous Carbon
100%
Carbon Films
100%
Carrier Concentration
100%
Carrier Mobility
50%
Electrical Resistivity
100%
Film
50%
Magnetron Sputtering
50%
Raman Spectroscopy
50%
X-Ray Photoelectron Spectroscopy
50%