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Effect of electric field on chemical mechanical polishing of langasite
Dae Soon Lim
*
, In Ho Yoon
, Steven Danyluk
*
Corresponding author for this work
Research output
:
Contribution to journal
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Article
›
peer-review
10
Citations (Scopus)
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Dive into the research topics of 'Effect of electric field on chemical mechanical polishing of langasite'. Together they form a unique fingerprint.
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Keyphrases
Electric Field (E-field)
100%
Chemical Mechanical Polishing
100%
Langasite
100%
Slurry
50%
Surface Charge
33%
DC Electric Field
33%
Single Crystal
16%
Field-assisted
16%
Particle Concentration
16%
Removal Rate
16%
Electrical Field
16%
Material Removal Rate
16%
Polishing Process
16%
Hardness Variation
16%
Functionalized Silica
16%
Silica Slurry
16%
Engineering
Chemical Mechanical Polishing
100%
Electric Field
100%
Slurry Particle
33%
Particle Concentration
16%
Removal Rate
16%
Polishing Process
16%
Material Removal Rate
16%
Silica Slurry
16%
Material Science
Chemical Mechanical Planarization
100%
Surface Charge
50%
Surface (Surface Science)
50%
Slurry Particle
50%
Silicon Dioxide
25%
Single Crystal
25%