Keyphrases
Metal-organic Chemical Vapor Deposition (MOCVD)
100%
M-plane
100%
GaN Growth
100%
M-plane GaN
100%
NH3 Flow Rate
100%
C-axis
75%
X-ray Rocking Curve
50%
A-axis
50%
Transmission Electron Microscopy
25%
Surface Morphology
25%
In Situ
25%
High Density
25%
AlN Buffer Layer
25%
Optical Reflectance
25%
Coherence Length
25%
Island Coalescence
25%
Basal Plane Stacking Fault
25%
Wulff Plot
25%
Surface Striation
25%
Material Science
Chemical Vapor Deposition
100%
Aluminum Nitride
100%
X-Ray Diffractogram
100%
Transmission Electron Microscopy
50%
Density
50%
Surface Morphology
50%
Buffer Layer
50%
Surface (Surface Science)
50%
Crystal Defect
50%
Engineering
Flow Rate
100%
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Flow Velocity
100%
Surface Morphology
25%
Buffer Layer
25%
Broadening
25%
Basal Plane
25%
Coherence Length
25%
Reflectance
25%