Effect of platinum co-sputtering on characteristics of amorphous vanadium oxide films

Han Ki Kim; Tae Yeon Seong; Young Soo Yoon

doi:10.1016/S0378-7753(02)00343-9

Effect of platinum co-sputtering on characteristics of amorphous vanadium oxide films

Han Ki Kim, Tae Yeon Seong, Young Soo Yoon

Research output: Contribution to journal › Article › peer-review

11 Citations (Scopus)

Abstract

The effect of platinum co-sputtering on the characteristics of amorphous V₂O₅ films, grown by dc reactive sputtering, is investigated. The co-sputtering process influences the growth mechanism as well as the characteristics of the V₂O₅ films. Glancing-angle X-ray diffraction (GXRD), transmission electron microscopy (TEM), and Fourier transform infrared (FT-IR) results indicate that the microstructure of the V₂O₅ films is affected by the rf power of the co-sputtered platinum. In addition, it is found that the platinum co-sputtered V₂O₅ cathode film exhibits better cycleability than an undoped V₂O₅ cathode film. This is due to the absence of short-range order, which is generally present in undoped V₂O₅ cathode films. Possible explanations are given to describe the dependence of the cycleability V₂O₅ films on the platinum rf power and the growth mechanism of the V₂O₅ film.

Original language	English
Pages (from-to)	67-75
Number of pages	9
Journal	Journal of Power Sources
Volume	112
Issue number	1
DOIs	https://doi.org/10.1016/S0378-7753(02)00343-9
Publication status	Published - 2002 Oct 24
Externally published	Yes

Keywords

Cycleability
Micro-power source
Platinum co-sputtering
Short-range order
Thin-film battery
VO

ASJC Scopus subject areas

Renewable Energy, Sustainability and the Environment
Energy Engineering and Power Technology
Physical and Theoretical Chemistry
Electrical and Electronic Engineering

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1016/S0378-7753(02)00343-9

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title = "Effect of platinum co-sputtering on characteristics of amorphous vanadium oxide films",

abstract = "The effect of platinum co-sputtering on the characteristics of amorphous V2O5 films, grown by dc reactive sputtering, is investigated. The co-sputtering process influences the growth mechanism as well as the characteristics of the V2O5 films. Glancing-angle X-ray diffraction (GXRD), transmission electron microscopy (TEM), and Fourier transform infrared (FT-IR) results indicate that the microstructure of the V2O5 films is affected by the rf power of the co-sputtered platinum. In addition, it is found that the platinum co-sputtered V2O5 cathode film exhibits better cycleability than an undoped V2O5 cathode film. This is due to the absence of short-range order, which is generally present in undoped V2O5 cathode films. Possible explanations are given to describe the dependence of the cycleability V2O5 films on the platinum rf power and the growth mechanism of the V2O5 film.",

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author = "Kim, {Han Ki} and Seong, {Tae Yeon} and Yoon, {Young Soo}",

year = "2002",

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doi = "10.1016/S0378-7753(02)00343-9",

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journal = "Journal of Power Sources",

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T1 - Effect of platinum co-sputtering on characteristics of amorphous vanadium oxide films

AU - Kim, Han Ki

AU - Seong, Tae Yeon

AU - Yoon, Young Soo

PY - 2002/10/24

Y1 - 2002/10/24

N2 - The effect of platinum co-sputtering on the characteristics of amorphous V2O5 films, grown by dc reactive sputtering, is investigated. The co-sputtering process influences the growth mechanism as well as the characteristics of the V2O5 films. Glancing-angle X-ray diffraction (GXRD), transmission electron microscopy (TEM), and Fourier transform infrared (FT-IR) results indicate that the microstructure of the V2O5 films is affected by the rf power of the co-sputtered platinum. In addition, it is found that the platinum co-sputtered V2O5 cathode film exhibits better cycleability than an undoped V2O5 cathode film. This is due to the absence of short-range order, which is generally present in undoped V2O5 cathode films. Possible explanations are given to describe the dependence of the cycleability V2O5 films on the platinum rf power and the growth mechanism of the V2O5 film.

AB - The effect of platinum co-sputtering on the characteristics of amorphous V2O5 films, grown by dc reactive sputtering, is investigated. The co-sputtering process influences the growth mechanism as well as the characteristics of the V2O5 films. Glancing-angle X-ray diffraction (GXRD), transmission electron microscopy (TEM), and Fourier transform infrared (FT-IR) results indicate that the microstructure of the V2O5 films is affected by the rf power of the co-sputtered platinum. In addition, it is found that the platinum co-sputtered V2O5 cathode film exhibits better cycleability than an undoped V2O5 cathode film. This is due to the absence of short-range order, which is generally present in undoped V2O5 cathode films. Possible explanations are given to describe the dependence of the cycleability V2O5 films on the platinum rf power and the growth mechanism of the V2O5 film.

KW - Cycleability

KW - Micro-power source

KW - Platinum co-sputtering

KW - Short-range order

KW - Thin-film battery

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JF - Journal of Power Sources

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Effect of platinum co-sputtering on characteristics of amorphous vanadium oxide films

Abstract

Keywords

ASJC Scopus subject areas

UN SDGs

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