Effect of platinum co-sputtering on characteristics of amorphous vanadium oxide films

Han Ki Kim, Tae Yeon Seong, Young Soo Yoon

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)


The effect of platinum co-sputtering on the characteristics of amorphous V2O5 films, grown by dc reactive sputtering, is investigated. The co-sputtering process influences the growth mechanism as well as the characteristics of the V2O5 films. Glancing-angle X-ray diffraction (GXRD), transmission electron microscopy (TEM), and Fourier transform infrared (FT-IR) results indicate that the microstructure of the V2O5 films is affected by the rf power of the co-sputtered platinum. In addition, it is found that the platinum co-sputtered V2O5 cathode film exhibits better cycleability than an undoped V2O5 cathode film. This is due to the absence of short-range order, which is generally present in undoped V2O5 cathode films. Possible explanations are given to describe the dependence of the cycleability V2O5 films on the platinum rf power and the growth mechanism of the V2O5 film.

Original languageEnglish
Pages (from-to)67-75
Number of pages9
JournalJournal of Power Sources
Issue number1
Publication statusPublished - 2002 Oct 24
Externally publishedYes


  • Cycleability
  • Micro-power source
  • Platinum co-sputtering
  • Short-range order
  • Thin-film battery
  • VO

ASJC Scopus subject areas

  • Renewable Energy, Sustainability and the Environment
  • Energy Engineering and Power Technology
  • Physical and Theoretical Chemistry
  • Electrical and Electronic Engineering


Dive into the research topics of 'Effect of platinum co-sputtering on characteristics of amorphous vanadium oxide films'. Together they form a unique fingerprint.

Cite this