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Effect of rapid thermal annealing on Al doped n-ZnO films grown by RF-magnetron sputtering
Kyoung Kook Kim
*
, Hitoshi Tampo
, June O. Song
,
Tae Yeon Seong
, Seong Ju Park
, Ji Myon Lee
, Sang Woo Kim
, Shizuo Fujita
, Shigeru Niki
*
Corresponding author for this work
Research output
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Contribution to journal
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Article
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peer-review
62
Citations (Scopus)
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Keyphrases
Annealing
100%
ZnO Film
100%
Rapid Thermal Annealing
100%
RF Magnetron Sputtering
100%
NZnO
100%
Al-doped
100%
Electrical Properties
66%
Optical Properties
66%
Magnetron Sputtering Deposition
33%
Carrier Concentration
33%
As-deposited
33%
Al-doped ZnO Films
33%
Cm(III)
33%
Epilayer
33%
Al Oxide
33%
Pre-oxidation
33%
Al Dopant
33%
Material Science
Film
100%
ZnO
100%
Annealing
100%
Magnetron Sputtering
100%
Optical Property
50%
Oxide Compound
25%
Epilayers
25%
Doping (Additives)
25%
Carrier Concentration
25%
Surface (Surface Science)
25%