Effect of the Mo back contact microstructure on the preferred orientation of CIGS thin films

Ju Heon Yoon, Kwan Hee Yoon, Jong Keun Kim, Won Mok Kim, Jong Keuk Park, Taek Sung Lee, Young Joon Baik, Tae Yeon Seong, Jeung Hyun Jeong

Research output: Chapter in Book/Report/Conference proceedingConference contribution

28 Citations (Scopus)

Abstract

The effect of varying microstructures of Mo films on CIGS preferred orientation has been studied by changing Mo working pressure (in sputtering). CIGS I(220)/I(112) and IGS I(300)/I(006) have strong dependencies of the residual stress of Mo closely related to its microstructures: they increases with Mo pressure and then gradually decreases with Mo pressure, as the residual stress does. The trend is exactly opposite to the known effect due to Na. Thus this work shows that Mo microstructure itself can determine IGS and CIGS textures without assistance of other factors such as Na. XRD analysis on selenized Mo and TEM work on IGS/Mo show that MoSe2 reactivity itself influences the IGS texture more than its orientation. In addition, MoSe 2 reactivity depends on the in-grain density of Mo which is linearly related to the residual stress.

Original languageEnglish
Title of host publicationProgram - 35th IEEE Photovoltaic Specialists Conference, PVSC 2010
Pages2443-2447
Number of pages5
DOIs
Publication statusPublished - 2010
Event35th IEEE Photovoltaic Specialists Conference, PVSC 2010 - Honolulu, HI, United States
Duration: 2010 Jun 202010 Jun 25

Publication series

NameConference Record of the IEEE Photovoltaic Specialists Conference
ISSN (Print)0160-8371

Other

Other35th IEEE Photovoltaic Specialists Conference, PVSC 2010
Country/TerritoryUnited States
CityHonolulu, HI
Period10/6/2010/6/25

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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