Effect of the plasma treatment of anode electrode of the organic light-emitting diodes on the growth of hole-injection layer

Young Wook Park; Jong Hoon Jang; Young Min Kim; Jin Hwan Choi; Tae Hyun Park; Jinnil Choi; Byeong Kwon Ju

doi:10.1016/j.tsf.2009.01.180

Effect of the plasma treatment of anode electrode of the organic light-emitting diodes on the growth of hole-injection layer

Young Wook Park, Jong Hoon Jang, Young Min Kim, Jin Hwan Choi, Tae Hyun Park, Jinnil Choi, Byeong Kwon Ju

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

In this paper, we focused on the effects of the plasma treatment of the anode electrode of organic light emitting diodes (OLED) on the growth of hole-injection layer (HIL). The CF₄ plasma (CF₄-P) treatment, which is known for efficient method to enhance the performance of OLED, was not effective on the OLED with the HIL material copper phthalocyanine (CuPc). The CF₄-P treated OLED showed remarkably reduced electroluminescence (EL) characteristics while the O₂ plasma treated OLED showed improved EL efficiency. The dependence of the CuPc growth on the polarity of substrate induced the morphological difference of the HIL, and finally resulted in the different device characteristics.

Original language	English
Pages (from-to)	4108-4110
Number of pages	3
Journal	Thin Solid Films
Volume	517
Issue number	14
DOIs	https://doi.org/10.1016/j.tsf.2009.01.180
Publication status	Published - 2009 May 29

Bibliographical note

Funding Information:
This work was supported by the Korea Science and Engineering Foundation (KOSEF) grant funded by the Korea Ministry of Education, Science and Technology (MEST) (No. R11-2007-045-01003-0), and partially supported by the National Research Laboratory (NRL, R0A-2007-000-20111-0) Program of the KOSEF.

Keywords

Copper phthalocyanine
Hole-injection layer
Morphology
Organic light-emitting diodes
Surface polarity

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

Access to Document

10.1016/j.tsf.2009.01.180

Cite this

@article{971705db97624caba4018ec01457dc69,

title = "Effect of the plasma treatment of anode electrode of the organic light-emitting diodes on the growth of hole-injection layer",

abstract = "In this paper, we focused on the effects of the plasma treatment of the anode electrode of organic light emitting diodes (OLED) on the growth of hole-injection layer (HIL). The CF4 plasma (CF4-P) treatment, which is known for efficient method to enhance the performance of OLED, was not effective on the OLED with the HIL material copper phthalocyanine (CuPc). The CF4-P treated OLED showed remarkably reduced electroluminescence (EL) characteristics while the O2 plasma treated OLED showed improved EL efficiency. The dependence of the CuPc growth on the polarity of substrate induced the morphological difference of the HIL, and finally resulted in the different device characteristics.",

keywords = "Copper phthalocyanine, Hole-injection layer, Morphology, Organic light-emitting diodes, Surface polarity",

author = "Park, {Young Wook} and Jang, {Jong Hoon} and Kim, {Young Min} and Choi, {Jin Hwan} and Park, {Tae Hyun} and Jinnil Choi and Ju, {Byeong Kwon}",

note = "Funding Information: This work was supported by the Korea Science and Engineering Foundation (KOSEF) grant funded by the Korea Ministry of Education, Science and Technology (MEST) (No. R11-2007-045-01003-0), and partially supported by the National Research Laboratory (NRL, R0A-2007-000-20111-0) Program of the KOSEF.",

year = "2009",

month = may,

day = "29",

doi = "10.1016/j.tsf.2009.01.180",

language = "English",

volume = "517",

pages = "4108--4110",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

number = "14",

}

TY - JOUR

T1 - Effect of the plasma treatment of anode electrode of the organic light-emitting diodes on the growth of hole-injection layer

AU - Park, Young Wook

AU - Jang, Jong Hoon

AU - Kim, Young Min

AU - Choi, Jin Hwan

AU - Park, Tae Hyun

AU - Choi, Jinnil

AU - Ju, Byeong Kwon

N1 - Funding Information: This work was supported by the Korea Science and Engineering Foundation (KOSEF) grant funded by the Korea Ministry of Education, Science and Technology (MEST) (No. R11-2007-045-01003-0), and partially supported by the National Research Laboratory (NRL, R0A-2007-000-20111-0) Program of the KOSEF.

PY - 2009/5/29

Y1 - 2009/5/29

N2 - In this paper, we focused on the effects of the plasma treatment of the anode electrode of organic light emitting diodes (OLED) on the growth of hole-injection layer (HIL). The CF4 plasma (CF4-P) treatment, which is known for efficient method to enhance the performance of OLED, was not effective on the OLED with the HIL material copper phthalocyanine (CuPc). The CF4-P treated OLED showed remarkably reduced electroluminescence (EL) characteristics while the O2 plasma treated OLED showed improved EL efficiency. The dependence of the CuPc growth on the polarity of substrate induced the morphological difference of the HIL, and finally resulted in the different device characteristics.

AB - In this paper, we focused on the effects of the plasma treatment of the anode electrode of organic light emitting diodes (OLED) on the growth of hole-injection layer (HIL). The CF4 plasma (CF4-P) treatment, which is known for efficient method to enhance the performance of OLED, was not effective on the OLED with the HIL material copper phthalocyanine (CuPc). The CF4-P treated OLED showed remarkably reduced electroluminescence (EL) characteristics while the O2 plasma treated OLED showed improved EL efficiency. The dependence of the CuPc growth on the polarity of substrate induced the morphological difference of the HIL, and finally resulted in the different device characteristics.

KW - Copper phthalocyanine

KW - Hole-injection layer

KW - Morphology

KW - Organic light-emitting diodes

KW - Surface polarity

UR - http://www.scopus.com/inward/record.url?scp=65449186925&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2009.01.180

DO - 10.1016/j.tsf.2009.01.180

M3 - Article

AN - SCOPUS:65449186925

SN - 0040-6090

VL - 517

SP - 4108

EP - 4110

JO - Thin Solid Films

JF - Thin Solid Films

IS - 14

ER -

Effect of the plasma treatment of anode electrode of the organic light-emitting diodes on the growth of hole-injection layer

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this